Through-the-lens neutralization for charged particle beam system
AssigneeFEI Company
InventorsRobert L. Gerlach, Mark W. Utlaut
Life of this patent
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Abstract
An electron source provides electrons that are directed through the final lens of an ion optical column to neutralize at least a portion of the accumulated charge on a sample. The invention can optionally be combined with collection of secondary electrons through the final ion lens. A deflector directs the neutralizing electrons onto the ion beam optical axis and deflects the secondary electrons away from the optical axis for detection. For imaging, a high-pass energy filter separates secondary electrons generated from the neutralizing electron beam from secondary electrons generated by the ion beam.
Claims22
An apparatus for neutralizing electrical charge on a sample in a focused ion beam system, comprising:
- a source of neutralizing electrons positioned away from the optical axis;
- an ion optical column having an optical axis and including a final lens;
- and
- a deflector for deflecting the neutralizing electrons onto the optical axis and through the final lens to neutralize electrical charge on the sample.
A method of neutralizing charge on a sample in a charged particle beam system comprising passing charged particles through the final lens of the charged particle beam system to neutralize charges on the sample.
Dependencies are inferred from the claim text.