H01J 2237/0802
Field ionization sources
H01J2237/0802 (Field ionization sources) appears on 222 US grants and 216 published applications in this corpus.
Search patents in H01J- Granted patents
- 222
- Published applications
- 216
- Assignees
- 71
- Inventors
- 321
- Latest grant
- 21 Oct 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 4 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 4 | 0 |
| 1991 | 2 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 4 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 2 | 2 |
| 2003 | 1 | 1 |
| 2004 | 1 | 1 |
| 2005 | 3 | 4 |
| 2006 | 2 | 6 |
| 2007 | 4 | 23 |
| 2008 | 5 | 8 |
| 2009 | 18 | 18 |
| 2010 | 10 | 16 |
| 2011 | 8 | 16 |
| 2012 | 18 | 17 |
| 2013 | 22 | 17 |
| 2014 | 18 | 12 |
| 2015 | 18 | 13 |
| 2016 | 11 | 7 |
| 2017 | 8 | 10 |
| 2018 | 3 | 6 |
| 2019 | 9 | 10 |
| 2020 | 10 | 7 |
| 2021 | 5 | 6 |
| 2022 | 5 | 9 |
| 2023 | 6 | 2 |
| 2024 | 5 | 3 |
| 2025 | 3 | 1 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Gas ion gun21 Oct 2025US 12,451,320 B2Centre National De La Recherche Scientifique
- Particle beam device having a deflection unit29 Apr 2025US 12,288,664 B2Carl Zeiss Microscopy GmbH
- Charged particle gun and charged particle beam device1 Apr 2025US 12,266,500 B2Hitachi High-Tech Corporation
- Automated operational control of micro-tooling devices24 Dec 2024US 12,176,182 B2Carl Zeiss SMT GmbH
- Ion beam device19 Nov 2024US 12,148,593 B2Hitachi High-Tech Corporation
- Insulator, Charged Particle Gun, and Charged Particle Beam Device6 Aug 2026US 2026/0229440 A1Hitachi High-Tech Corporation
- Editing of deep, multi-layered structures21 Aug 2025US 2025/0266240 A1
- Liquid metal ion source device for using bismuth and alloy of bismuth3 Oct 2024US 2024/0331967 A1Korea Basic Science Institute
- Method of operating an ion beam source, ion beam source and computer program8 Aug 2024US 2024/0266139 A1
- Ion beam device and emitter tip milling method20 Jun 2024US 2024/0203682 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Multilayered device micro etching method and system96US 5,055,696 AHitachi, Ltd. · 1991
- Ion sources, systems and methods93US 7,554,096 B2ALIS Corporation · 2009
- Ion source, ion beam processing/observation apparatus, charged particle beam apparatus, and method for observing cross section of sample88US 8,779,400 B2Hitachi High-Technologies Corporation · 2014
- Processing method and apparatus using focused ion beam generating means79US 5,825,035 AHitachi, Ltd. · 1998
- Processing method using a focused ion beam77US 4,457,803 ATokyo Shibaura Denki Kabushiki Kaisha · 1984