H01J 2237/0635
Multiple source
Official title: Multiple source, e.g. comb or array
H01J2237/0635 (Multiple source) appears on 73 US grants and 73 published applications in this corpus.
Search patents in H01J- Granted patents
- 73
- Published applications
- 73
- Assignees
- 42
- Inventors
- 163
- Latest grant
- 21 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 6 |
| 2002 | 1 | 1 |
| 2003 | 1 | 3 |
| 2004 | 2 | 8 |
| 2005 | 8 | 4 |
| 2006 | 5 | 3 |
| 2007 | 1 | 5 |
| 2008 | 4 | 3 |
| 2009 | 2 | 4 |
| 2010 | 3 | 2 |
| 2011 | 2 | 4 |
| 2012 | 1 | 1 |
| 2013 | 3 | 0 |
| 2014 | 2 | 2 |
| 2015 | 2 | 0 |
| 2016 | 3 | 3 |
| 2017 | 5 | 1 |
| 2018 | 3 | 3 |
| 2019 | 1 | 3 |
| 2020 | 4 | 3 |
| 2021 | 5 | 5 |
| 2022 | 3 | 1 |
| 2023 | 2 | 3 |
| 2024 | 1 | 3 |
| 2025 | 0 | 1 |
| 2026 | 2 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Multiple electron beam optics21 Jul 2026US 12,688,993 B2Applied Materials Israel Ltd.
- Charged particle assessment tool, inspection method10 Feb 2026US 12,548,735 B2ASML Netherlands B. V.
- Charged particle assessment tool, inspection method14 May 2024US 11,984,295 B2ASML Netherlands B. V.
- Charged particle assessment tool, inspection method24 Oct 2023US 11,798,783 B2ASML Netherlands B. V.
- Light modulated electron source1 Aug 2023US 11,715,615 B2KLA Corporation
- Charged particle assessment tool, inspection method28 May 2026US 2026/0148935 A1ASML Netherlands B. V.
- Charged particle-optical apparatus7 Aug 2025US 2025/0253123 A1ASML Netherlands B. V.
- Multiple electron beam optics21 Nov 2024US 2024/0387140 A1Applied Materials Israel Ltd.
- Charged particle assessment tool, inspection method25 Jul 2024US 2024/0249912 A1ASML Netherlands B. V.
- Charged particle apparatus and method18 Apr 2024US 2024/0128043 A1ASML Netherlands B. V.
Most cited
By later US patents
- Apparatus and methods for inspecting wafers and masks using multiple charged-particle beams156US 5,892,224 ANikon Corporation · 1999
- Pattern inspection apparatus and electron beam apparatus86US 5,557,105 AFujitsu Limited · 1996
- Microtip-controlled nanostructure fabrication and multi-tipped field-emission tool for parallel-process nanostructure fabrication64US 5,126,574 AThe United States of America as represented by the Secretary of Commerce · 1992
- Multi-beam scanning electron beam device and methods of using the same48US 9,153,413 B2Applied Materials Israel Ltd. · 2015
- Multi-beam exposure apparatus using a multi-axis electron lens, fabrication method of a semiconductor device44US 6,787,780 B2Advantest Corporation · 2004