H01J 2237/06341
Field emission
H01J2237/06341 (Field emission) appears on 203 US grants and 206 published applications in this corpus.
Search patents in H01J- Granted patents
- 203
- Published applications
- 206
- Assignees
- 114
- Inventors
- 468
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 3 | 0 |
| 1995 | 1 | 0 |
| 1996 | 3 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 6 |
| 2002 | 1 | 3 |
| 2003 | 1 | 3 |
| 2004 | 5 | 8 |
| 2005 | 8 | 8 |
| 2006 | 7 | 7 |
| 2007 | 3 | 10 |
| 2008 | 8 | 13 |
| 2009 | 8 | 14 |
| 2010 | 8 | 12 |
| 2011 | 11 | 10 |
| 2012 | 6 | 3 |
| 2013 | 6 | 10 |
| 2014 | 11 | 4 |
| 2015 | 8 | 5 |
| 2016 | 6 | 7 |
| 2017 | 12 | 4 |
| 2018 | 10 | 8 |
| 2019 | 8 | 15 |
| 2020 | 13 | 6 |
| 2021 | 11 | 12 |
| 2022 | 7 | 10 |
| 2023 | 10 | 13 |
| 2024 | 5 | 6 |
| 2025 | 11 | 6 |
| 2026 | 3 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Electron emission methods to generate electron beams with a narrow energy distribution25 Aug 2026US 12,719,005 B2The Regents of the University of California
- Multiple electron beam optics21 Jul 2026US 12,688,993 B2Applied Materials Israel Ltd.
- Charged particle assessment tool, inspection method10 Feb 2026US 12,548,735 B2ASML Netherlands B. V.
- Quasi-macroscopic cold cathode field emission electron gun and manufacturing method thereof11 Nov 2025US 12,469,663 B2Zhengzhou University of Aeronautics
- Charged particle beam device11 Nov 2025US 12,469,665 B2Hitachi High-Tech Corporation
- Insulator, Charged Particle Gun, and Charged Particle Beam Device6 Aug 2026US 2026/0229440 A1Hitachi High-Tech Corporation
- Charged Particle Beam Device6 Aug 2026US 2026/0229443 A1Hitachi High-Tech Corporation
- Charged particle assessment tool, inspection method28 May 2026US 2026/0148935 A1ASML Netherlands B. V.
- Junction between hexaboride-containing and tantalum-containing components20 Nov 2025US 2025/0357069 A1FEI Company
- Charged particle beam device28 Aug 2025US 2025/0273422 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Apparatus and methods for inspecting wafers and masks using multiple charged-particle beams156US 5,892,224 ANikon Corporation · 1999
- Pattern inspection apparatus and electron beam apparatus86US 5,557,105 AFujitsu Limited · 1996
- Microtip-controlled nanostructure fabrication and multi-tipped field-emission tool for parallel-process nanostructure fabrication64US 5,126,574 AThe United States of America as represented by the Secretary of Commerce · 1992
- Charged particle beam apparatus55US 7,582,885 B2Hitachi High-Technologies Corporation · 2009
- Multi-beam scanning electron beam device and methods of using the same48US 9,153,413 B2Applied Materials Israel Ltd. · 2015