H01J 2237/04735
With electrostatic means
Official title: with electrostatic means
H01J2237/04735 (With electrostatic means) appears on 116 US grants and 127 published applications in this corpus.
Search patents in H01J- Granted patents
- 116
- Published applications
- 127
- Assignees
- 69
- Inventors
- 324
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 4 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 2 | 1 |
| 2002 | 3 | 2 |
| 2003 | 5 | 4 |
| 2004 | 1 | 3 |
| 2005 | 4 | 4 |
| 2006 | 2 | 4 |
| 2007 | 2 | 3 |
| 2008 | 3 | 6 |
| 2009 | 3 | 11 |
| 2010 | 9 | 4 |
| 2011 | 5 | 1 |
| 2012 | 2 | 4 |
| 2013 | 5 | 3 |
| 2014 | 2 | 3 |
| 2015 | 7 | 5 |
| 2016 | 3 | 2 |
| 2017 | 3 | 5 |
| 2018 | 4 | 2 |
| 2019 | 3 | 3 |
| 2020 | 2 | 6 |
| 2021 | 4 | 4 |
| 2022 | 4 | 13 |
| 2023 | 9 | 3 |
| 2024 | 4 | 10 |
| 2025 | 3 | 8 |
| 2026 | 5 | 13 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- Ion milling apparatus16 Jun 2026US 12,658,399 B2Hitachi High-Tech Corporation
- Ion implanter and ion implantation method16 Jun 2026US 12,658,404 B2Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Approach to increase LINAC operating range of linear accelerator28 Apr 2026US 12,615,706 B2APPLIED Materials.Inc.
- Structure for particle acceleration and charged particle beam apparatus24 Mar 2026US 12,586,748 B2Hitachi High-Tech Corporation
- Particle beam microscope24 Sep 2026US 2026/0290747 A1
- Charged Particle Beam Device3 Sep 2026US 2026/0260845 A1Hitachi High-Tech Corporation
- Charged Particle Beam Device6 Aug 2026US 2026/0229443 A1Hitachi High-Tech Corporation
- Ion implantation device18 Jun 2026US 2026/0171344 A1Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Electron Microscope and Specimen Observation Method11 Jun 2026US 2026/0162923 A1JEOL Ltd.
Most cited
By later US patents
- Particle-optical systems and arrangements and particle-optical components for such systems and arrangements98US 7,244,949 B2Applied Materials Israel Ltd. · 2007
- Producing RF electric fields suitable for accelerating atomic and molecular ions in an ion implantation system72US 5,504,341 AZimec Consulting, Inc. · 1996
- Scanning electron microscope66US 6,847,038 B2Hitachi, Ltd. · 2005
- Electron lithography apparatus50US 4,695,732 AU. S. Philips Corporation · 1987
- Ion implanter and a method of implanting ions49US 6,423,976 B1APPLIED Materials.Inc. · 2002