G03F 7/70891
Temperature
Official title: {Temperature}
G03F7/70891 (Temperature) appears on 683 US grants and 771 published applications in this corpus.
Search patents in G03F- Granted patents
- 683
- Published applications
- 771
- Assignees
- 103
- Inventors
- 1,451
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 2 | 0 |
| 1986 | 2 | 0 |
| 1987 | 3 | 0 |
| 1988 | 4 | 0 |
| 1989 | 2 | 0 |
| 1990 | 1 | 0 |
| 1991 | 2 | 0 |
| 1992 | 5 | 0 |
| 1993 | 1 | 0 |
| 1994 | 4 | 0 |
| 1995 | 7 | 0 |
| 1996 | 3 | 0 |
| 1997 | 5 | 0 |
| 1998 | 10 | 0 |
| 1999 | 18 | 0 |
| 2000 | 5 | 0 |
| 2001 | 11 | 13 |
| 2002 | 12 | 21 |
| 2003 | 18 | 14 |
| 2004 | 20 | 29 |
| 2005 | 16 | 37 |
| 2006 | 26 | 24 |
| 2007 | 21 | 28 |
| 2008 | 16 | 36 |
| 2009 | 16 | 30 |
| 2010 | 17 | 34 |
| 2011 | 19 | 36 |
| 2012 | 28 | 27 |
| 2013 | 24 | 40 |
| 2014 | 44 | 27 |
| 2015 | 28 | 29 |
| 2016 | 38 | 26 |
| 2017 | 33 | 22 |
| 2018 | 31 | 26 |
| 2019 | 30 | 25 |
| 2020 | 24 | 26 |
| 2021 | 21 | 25 |
| 2022 | 17 | 27 |
| 2023 | 19 | 45 |
| 2024 | 21 | 46 |
| 2025 | 31 | 38 |
| 2026 | 25 | 40 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Mirror, optical system and method for operating an optical system6 Oct 2026US 12,754,483 B2Carl Zeiss SMT GmbH
- Optical element, optical arrangement and insert component15 Sep 2026US 12,736,773 B2Carl Zeiss SMT GmbH
- Adaptive optical element for microlithography15 Sep 2026US 12,736,885 B2Carl Zeiss SMT GmbH
- Light source apparatus, lithography apparatus, and article manufacturing method25 Aug 2026US 12,717,240 B2Canon Kabushiki Kaisha
- Microelectromechanical apparatus with heating element18 Aug 2026US 12,710,619 B2Carl Zeiss SMT GmbH
- Extreme ultraviolet lithography system8 Oct 2026US 2026/0310108 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Short-wave systems and methods and suitable targets thereof10 Sep 2026US 2026/0267230 A1L2X-Labs Ltd
- Euv mirror with improved optical stability10 Sep 2026US 2026/0267232 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Silencer and lithographic apparatus thermal conditioning system27 Aug 2026US 2026/0251255 A1ASML Netherlands B. V.
- Fluid transport system temperature conditioning system lithographic apparatus and flexible hose13 Aug 2026US 2026/0235246 A1ASML Netherlands B. V.
Most cited
By later US patents
- Photolithographic method for the manufacture of integrated circuits1,126US 4,346,164 A1982
- Immersion type projection exposure apparatus1,116US 5,610,683 ACanon Kabushiki Kaisha · 1997
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Apparatus for the photolithographic manufacture of integrated circuit elements958US 4,509,852 A1985
- Method for optical inspection and lithography624US 5,900,354 A1999