G03F 7/0388
With ethylenic or acetylenic bands in the side chains of the photopolymer
Official title: {with ethylenic or acetylenic bands in the side chains of the photopolymer}
G03F7/0388 (With ethylenic or acetylenic bands in the side chains of the photopolymer) appears on 899 US grants and 1,017 published applications in this corpus.
Search patents in G03F- Granted patents
- 899
- Published applications
- 1,017
- Assignees
- 330
- Inventors
- 2,328
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 10 | 0 |
| 1977 | 8 | 0 |
| 1978 | 11 | 0 |
| 1979 | 9 | 0 |
| 1980 | 11 | 0 |
| 1981 | 17 | 0 |
| 1982 | 8 | 0 |
| 1983 | 13 | 0 |
| 1984 | 10 | 0 |
| 1985 | 9 | 0 |
| 1986 | 10 | 0 |
| 1987 | 8 | 0 |
| 1988 | 5 | 0 |
| 1989 | 13 | 0 |
| 1990 | 5 | 0 |
| 1991 | 15 | 0 |
| 1992 | 5 | 0 |
| 1993 | 12 | 0 |
| 1994 | 15 | 0 |
| 1995 | 7 | 0 |
| 1996 | 18 | 0 |
| 1997 | 10 | 0 |
| 1998 | 20 | 0 |
| 1999 | 18 | 0 |
| 2000 | 22 | 0 |
| 2001 | 19 | 9 |
| 2002 | 14 | 18 |
| 2003 | 17 | 27 |
| 2004 | 19 | 33 |
| 2005 | 13 | 33 |
| 2006 | 23 | 22 |
| 2007 | 12 | 26 |
| 2008 | 18 | 20 |
| 2009 | 12 | 24 |
| 2010 | 13 | 27 |
| 2011 | 9 | 25 |
| 2012 | 23 | 30 |
| 2013 | 11 | 26 |
| 2014 | 40 | 63 |
| 2015 | 35 | 87 |
| 2016 | 64 | 50 |
| 2017 | 47 | 33 |
| 2018 | 18 | 42 |
| 2019 | 31 | 41 |
| 2020 | 38 | 55 |
| 2021 | 17 | 41 |
| 2022 | 23 | 49 |
| 2023 | 24 | 51 |
| 2024 | 33 | 25 |
| 2025 | 23 | 83 |
| 2026 | 14 | 77 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Photosensitive resin composition, transfer film, cured film, laminate, and method for manufacturing touch panel25 Aug 2026US 12,717,230 B2FUJIFILM Corporation
- Method for preparing pixel define layer11 Aug 2026US 12,704,783 B2Duk San Neolux Co., Ltd.
- Free-radically polymerizable compounds, compositions including the same, polymerized compounds, methods of making and articles including the same2 Jun 2026US 12,645,139 B23M Innovative Properties Company
- Stepped substrate coating composition including compound having photocrosslinking group due to unsaturated bond between carbon atoms12 May 2026US 12,625,428 B2Nissan Chemical Corporation
- Photosensitive resin composition and method for producing cured relief pattern28 Apr 2026US 12,613,465 B2Asahi Kasei Kabushiki Kaisha
- Resist composition, resist pattern formation method, compound, and polymer compound8 Oct 2026US 2026/0310077 A1Tokyo Ohka Kogyo.Co., Ltd.
- Negative resist composition and method for producing resist pattern8 Oct 2026US 2026/0310078 A1Sumitomo Chemical Company, Limited
- Resist composition and resist pattern formation method1 Oct 2026US 2026/0299410 A1Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition, resist pattern formation method, compound and polymer compound1 Oct 2026US 2026/0299419 A1Tokyo Ohka Kogyo.Co., Ltd.
- Salt, acid generator, resin, resist composition, and method for producing resist pattern24 Sep 2026US 2026/0288002 A1Sumitomo Chemical Company, Limited
Most cited
By later US patents
- Radiation-curable polymers containing pendant unsaturated peptide groups derived from azlactone polymers111US 4,304,705 AMinnesota Mining and Manufacturing Company · 1981
- Solder resist composition and printed circuit boards97US 6,217,987 B1Ibiden Co., Ltd. · 2001
- UV/EB curable copolymers for lithographic and corrosion-resistant coating applications91US 5,376,503 AExxon Chemical Patents Inc. · 1994
- UV/EB curable butyl copolymers for lithographic and corrosion-resistant coating applications90US 5,585,416 AExxon Chemical Patents Inc. · 1996
- Tertiary amine compounds having an ester structure and processes for preparing same78US 7,084,303 B2Shin-Etsu Chemical Co., Ltd. · 2006