US 7,084,303 B2 · Tertiary amine compounds having an ester structure and processes for preparing same

Abstract

The present invention provides ester group-containing tertiary amine compounds of the formula (R1OCH2CH2)nN(CH2CH2CO2R2)3-n which, when used as additives in chemical amplification photolithography, can yield photoresists having a high resolution and an excellent focus margin. The present invention also provides a process comprising the step of subjecting a primary or secondary amine compound to Michael addition to an acrylic ester compound; a process comprising the steps of subjecting monoethanolamine or diethanolamine to Michael addition to an acrylic ester compound so as to form an ester group-containing amine compound and introducing a R1 group to the resultant ester group-containing amine compound; and a process comprising the step of effecting the ester exchange reaction of an ester group-containing tertiary amine with R2OH.

Claims8

Dependent claims

An ester group-containing tertiary amine compound represented by the following general formula (1)

(R1OCH2CH2)nN(CH2CH2CO2R2)3-n (1)
wherein n is 1 or 2;
and R1 independently represents a straight-chain, branched or cyclic saturated alkyl group of 1 to 20 carbon atoms which may contain an ether, or carbonyloxy group;
and R2 independently represents a straight-chain, branched or cyclic saturated alkyl group of 1 to 20 carbon atoms which may contain an ether, carbonyl or carbonyloxy group.

1 more element

Dependencies are inferred from the claim text.

Tertiary amine compounds having an ester structure and processes for preparing same

Life of this patent

Tertiary amine compounds having an ester structure and processes for preparing same

Life of this patent

Abstract

Claims8