G03F 1/46
Antireflective coatings
G03F1/46 (Antireflective coatings) appears on 146 US grants and 148 published applications in this corpus.
Search patents in G03F- Granted patents
- 146
- Published applications
- 148
- Assignees
- 63
- Inventors
- 307
- Latest grant
- 5 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 3 | 0 |
| 1998 | 2 | 0 |
| 1999 | 0 | 0 |
| 2000 | 3 | 0 |
| 2001 | 1 | 1 |
| 2002 | 4 | 5 |
| 2003 | 6 | 5 |
| 2004 | 7 | 6 |
| 2005 | 2 | 6 |
| 2006 | 4 | 3 |
| 2007 | 2 | 4 |
| 2008 | 4 | 6 |
| 2009 | 0 | 6 |
| 2010 | 7 | 7 |
| 2011 | 7 | 11 |
| 2012 | 10 | 6 |
| 2013 | 6 | 7 |
| 2014 | 9 | 5 |
| 2015 | 7 | 8 |
| 2016 | 5 | 3 |
| 2017 | 6 | 6 |
| 2018 | 5 | 7 |
| 2019 | 3 | 7 |
| 2020 | 7 | 6 |
| 2021 | 5 | 4 |
| 2022 | 5 | 6 |
| 2023 | 5 | 8 |
| 2024 | 6 | 9 |
| 2025 | 1 | 3 |
| 2026 | 2 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Optical lithography system and method of using the same5 May 2026US 12,619,157 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Hardmask structure for preparing semiconductor structure21 Apr 2026US 12,607,924 B2Nanya Technology Corporation
- Reflective mask blank, reflective mask, and method for manufacturing semiconductor device27 May 2025US 12,313,968 B2Hoya Corporation
- Extreme ultraviolet mask and method of manufacturing the same31 Dec 2024US 12,181,791 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Reflection mode photomask24 Dec 2024US 12,176,211 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Optical lithography system and method of using the same6 Aug 2026US 2026/0227703 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Optical coating for eliminating ghost images in optical metrology tools4 Jun 2026US 2026/0153405 A1APPLIED Materials.Inc.
- Blank mask and photomask8 Jan 2026US 2026/0010065 A1LG Innotek Co., Ltd.
- Reflective mask and method of making semiconductor device25 Sep 2025US 2025/0298304 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Layer stack for extreme ultraviolet lithography22 May 2025US 2025/0164891 A1Tokyo Electron Limited
Most cited
By later US patents
- EUV mask and method for forming the same127US 8,691,476 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Silica-based anti-reflective planarizing layer107US 5,100,503 ANCR Corporation · 1992
- Semiconductor mask blanks with a compatible stop layer85US 8,715,890 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Antireflection coating for highly reflective photolithographic layers comprising chromium oxide or chromium suboxide49US 5,672,243 AMosel Vitelic, Inc. · 1997
- Coatings on reflective mask substrates37US 6,352,803 B1The Regents of the University of California · 2002