G03F 1/42
Alignment or registration features
Official title: Alignment or registration features, e.g. alignment marks on the mask substrates
G03F1/42 (Alignment or registration features) appears on 348 US grants and 382 published applications in this corpus.
Search patents in G03F- Granted patents
- 348
- Published applications
- 382
- Assignees
- 128
- Inventors
- 870
- Latest grant
- 18 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 2 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 5 | 0 |
| 1999 | 4 | 0 |
| 2000 | 7 | 0 |
| 2001 | 5 | 1 |
| 2002 | 1 | 5 |
| 2003 | 3 | 3 |
| 2004 | 4 | 0 |
| 2005 | 2 | 2 |
| 2006 | 3 | 6 |
| 2007 | 2 | 3 |
| 2008 | 2 | 7 |
| 2009 | 2 | 7 |
| 2010 | 3 | 4 |
| 2011 | 4 | 2 |
| 2012 | 4 | 17 |
| 2013 | 12 | 17 |
| 2014 | 12 | 19 |
| 2015 | 19 | 20 |
| 2016 | 25 | 18 |
| 2017 | 18 | 13 |
| 2018 | 17 | 24 |
| 2019 | 27 | 33 |
| 2020 | 31 | 39 |
| 2021 | 31 | 33 |
| 2022 | 28 | 28 |
| 2023 | 21 | 34 |
| 2024 | 29 | 23 |
| 2025 | 12 | 12 |
| 2026 | 7 | 12 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Photomask including line pattern monitoring mark and method of manufacturing integrated circuit device using the same18 Aug 2026US 12,710,693 B2Samsung Electronics Co., Ltd.
- Multiple targets on substrate layers for layer alignment21 Jul 2026US 12,687,793 B2Intel Corporation
- Method of manufacturing semiconductor structure16 Jun 2026US 12,656,673 B2Nanya Technology Corporation
- Pattern forming method, semiconductor device manufacturing method, and pattern forming apparatus24 Feb 2026US 12,564,020 B2Kioxia Corporation
- Mask, exposure method and touch panel10 Feb 2026US 12,547,067 B2Boe Technology Group Co., Ltd.
- Multilayer reflective film coated substrate, reflective mask blank, reflective mask, method for manufacturing multilayer reflective film coated substrate, method for manufacturing reflective mask blank, and method for manufacturing reflective mask6 Aug 2026US 2026/0227687 A1AGC Inc.
- Pattern forming unit and method and apparatus for alignment30 Jul 2026US 2026/0219582 A1ORC Manufacturing Co., Ltd.
- Semiconductor lithography apparatus for measuring and/or registering structures and methods for measuring and/or registering structures23 Jul 2026US 2026/0211344 A1
- Methods and systems for determining reticle deformations16 Jul 2026US 2026/0202756 A1ASML Netherlands B. V.
- Mask, exposure method and touch panel14 May 2026US 2026/0133482 A1Boe Technology Group Co., Ltd.
Most cited
By later US patents
- Semiconductor device manufacturing method265US 6,703,328 B2Renesas Technology Corp. · 2004
- Lithography process149US 9,869,939 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2018
- Mask and method for forming the mask82US 8,709,682 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Method for fabricating a semiconductor with a photomask36US 5,665,495 AHyundai Electronics Industries Co., Ltd. · 1997
- Method for repairing lithographic transmission masks34US 4,751,169 AInternational Business Machines Corporation · 1988