G01N 2223/611
Patterned objects
Official title: patterned objects; electronic devices
G01N2223/611 (Patterned objects) appears on 472 US grants and 643 published applications in this corpus.
Search patents in G01N- Granted patents
- 472
- Published applications
- 643
- Assignees
- 206
- Inventors
- 1,477
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 1 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 0 | 3 |
| 2006 | 3 | 1 |
| 2007 | 2 | 5 |
| 2008 | 4 | 9 |
| 2009 | 5 | 2 |
| 2010 | 4 | 5 |
| 2011 | 2 | 9 |
| 2012 | 7 | 9 |
| 2013 | 15 | 17 |
| 2014 | 13 | 28 |
| 2015 | 15 | 29 |
| 2016 | 23 | 24 |
| 2017 | 25 | 38 |
| 2018 | 34 | 24 |
| 2019 | 23 | 42 |
| 2020 | 39 | 40 |
| 2021 | 49 | 47 |
| 2022 | 43 | 59 |
| 2023 | 38 | 66 |
| 2024 | 39 | 67 |
| 2025 | 49 | 65 |
| 2026 | 35 | 52 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Overlay target measurement and shift compensation in charged particle systems and related methods6 Oct 2026US 12,754,150 B2Applied Materials Israel Ltd.
- Patterned X-ray emitting target29 Sep 2026US 12,749,642 B2Nova Measuring Instruments Ltd.
- Methods and systems for model-less, scatterometry based measurements of semiconductor structures22 Sep 2026US 12,743,027 B2KLA Corporation
- Inspection system15 Sep 2026US 12,736,487 B2Hitachi High-Tech Corporation
- Wafer measurement apparatus and operating method thereof15 Sep 2026US 12,736,488 B2Samsung Electronics Co., Ltd.
- Battery cell inspection apparatus, battery cell inspection method, and battery cell inspection system8 Oct 2026US 2026/0309647 A1SK On Co., Ltd.
- Method for measuring defects in two-component compound wafer and apparatus thereof8 Oct 2026US 2026/0309655 A1SK Siltron Co., Ltd.
- In situ and tunable deposition of a film1 Oct 2026US 2026/0297727 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Corner drop test system for power lithium battery cell in transportation environment and method thereof1 Oct 2026US 2026/0298789 A1Chongqing Jiaotong University
- Hybrid x-ray and optical metrology and navigation24 Sep 2026US 2026/0287527 A1Tokyo Electron Limited
Most cited
By later US patents
- Electron-optical system for high-speed and high-sensitivity inspections113US 8,664,594 B1KLA-Tencor Corporation · 2014
- High resolution direct-projection type x-ray microtomography system using synchrotron or laboratory-based x-ray source67US 7,130,375 B1Xradia, Inc. · 2006
- Optical measuring device66US 7,003,075 B2Canon Kabushiki Kaisha · 2006
- High resolution direct-projection type x-ray microtomography system using synchrotron or laboratory-based x-ray source52US 7,400,704 B1Xradia, Inc. · 2008
- Multiple-beam system for high-speed electron-beam inspection52US 8,362,425 B2KLA-Tencor Corporation · 2013