C30B 25/14
Feed and outlet means for the gases
Official title: Feed and outlet means for the gases; Modifying the flow of the reactive gases
C30B25/14 (Feed and outlet means for the gases) appears on 1,011 US grants and 975 published applications in this corpus.
Search patents in C30B- Granted patents
- 1,011
- Published applications
- 975
- Assignees
- 471
- Inventors
- 2,238
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 4 | 0 |
| 1978 | 2 | 0 |
| 1979 | 3 | 0 |
| 1980 | 6 | 0 |
| 1981 | 0 | 0 |
| 1982 | 7 | 0 |
| 1983 | 4 | 0 |
| 1984 | 9 | 0 |
| 1985 | 10 | 0 |
| 1986 | 4 | 0 |
| 1987 | 7 | 0 |
| 1988 | 10 | 0 |
| 1989 | 14 | 0 |
| 1990 | 16 | 0 |
| 1991 | 18 | 0 |
| 1992 | 19 | 0 |
| 1993 | 25 | 0 |
| 1994 | 24 | 0 |
| 1995 | 24 | 0 |
| 1996 | 22 | 0 |
| 1997 | 14 | 0 |
| 1998 | 33 | 0 |
| 1999 | 30 | 0 |
| 2000 | 42 | 0 |
| 2001 | 37 | 21 |
| 2002 | 34 | 31 |
| 2003 | 28 | 41 |
| 2004 | 30 | 44 |
| 2005 | 25 | 34 |
| 2006 | 28 | 18 |
| 2007 | 9 | 35 |
| 2008 | 15 | 32 |
| 2009 | 9 | 37 |
| 2010 | 19 | 32 |
| 2011 | 11 | 41 |
| 2012 | 22 | 34 |
| 2013 | 27 | 41 |
| 2014 | 24 | 39 |
| 2015 | 18 | 49 |
| 2016 | 25 | 41 |
| 2017 | 33 | 38 |
| 2018 | 40 | 33 |
| 2019 | 37 | 23 |
| 2020 | 17 | 38 |
| 2021 | 28 | 28 |
| 2022 | 22 | 39 |
| 2023 | 31 | 54 |
| 2024 | 28 | 68 |
| 2025 | 39 | 49 |
| 2026 | 26 | 35 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Injectors, liners, process kits, processing chambers, and related methods for gas flow in batch processing of semiconductor manufacturing6 Oct 2026US 12,753,500 B2APPLIED Materials.Inc.
- Vertical photo-assisted metal organic chemical vapor deposition (MOCVD) apparatus and deposition method using same22 Sep 2026US 12,742,257 B2Peking University
- Method and device for depositing an epitaxial layer on a substrate wafer made of semiconductor material8 Sep 2026US 12,729,441 B2Siltronic AG
- Cassette structures and related methods for batch processing in epitaxial deposition operations8 Sep 2026US 12,733,452 B2APPLIED Materials.Inc.
- Batch processing apparatus, systems, and related methods and structures for epitaxial deposition operations28 Jul 2026US 12,696,707 B2APPLIED Materials.Inc.
- Device and method for mist chemical vapor deposition of large-size semiconductor thin film8 Oct 2026US 2026/0308759 A1Tiangong University
- Method and apparatus for suppression of defects during gallium oxide epitaxy8 Oct 2026US 2026/0308804 A1Kyma Technologies, Inc.
- Batch processing apparatus, systems, and related methods and structures for epitaxial deposition operations17 Sep 2026US 2026/0282793 A1APPLIED Materials.Inc.
- Batch processing apparatus, systems, and related methods and structures for epitaxial deposition operations17 Sep 2026US 2026/0282794 A1APPLIED Materials.Inc.
- Method and Device for Producing a SiC Solid Material10 Sep 2026US 2026/0265951 A1
Most cited
By later US patents
- Sequential chemical vapor deposition1,159US 5,916,365 A1999
- Method of forming graded thin films using alternating pulses of vapor phase reactants1,034US 6,534,395 B2ASM Microchemistry Oy · 2003
- Apparatus and method for growth of a thin film940US 6,511,539 B1ASM America, Inc. · 2003
- Vertically-stacked process reactor and cluster tool system for atomic layer deposition876US 5,879,459 AGenus, Inc. · 1999
- Method and equipment for growing thin films872US 5,711,811 AMikrokemia Oy · 1998