Cassette structures and related methods for batch processing in epitaxial deposition operations

A cassette configured for disposition in a substrate processing chamber, comprising:

• a first wall;
• a second wall spaced from the first wall;
• one or more sidewalls extending between and coupled to the first wall and the second wall;
• one or more inlet openings formed in the one or more sidewalls;
• one or more outlet openings formed in the one or more sidewalls opposite the one or more inlet openings;
• and
• a plurality of levels comprising a plurality of substrate supports mounted to the one or more sidewalls and spaced from each other along the one or more sidewalls, the one or more sidewalls defining a sleeve that surrounds by more than 180 degrees the plurality of substrate supports disposed in an internal volume, and the plurality of substrate supports comprising:
• a plurality of arcuate ring segments respectively comprising:
• an outer ledge that extends into the one or more sidewalls, and
• an inner ledge that extends inwardly relative to the one or more sidewalls.