C23C 16/54
Apparatus specially adapted for continuous coating
C23C16/54 (Apparatus specially adapted for continuous coating) appears on 1,824 US grants and 2,303 published applications in this corpus.
Search patents in C23C- Granted patents
- 1,824
- Published applications
- 2,303
- Assignees
- 799
- Inventors
- 4,852
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 5 | 0 |
| 1977 | 3 | 0 |
| 1978 | 7 | 0 |
| 1979 | 2 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 5 | 0 |
| 1983 | 5 | 0 |
| 1984 | 9 | 0 |
| 1985 | 10 | 0 |
| 1986 | 14 | 0 |
| 1987 | 17 | 0 |
| 1988 | 15 | 0 |
| 1989 | 29 | 0 |
| 1990 | 23 | 0 |
| 1991 | 20 | 0 |
| 1992 | 28 | 0 |
| 1993 | 27 | 0 |
| 1994 | 42 | 0 |
| 1995 | 38 | 0 |
| 1996 | 36 | 0 |
| 1997 | 30 | 0 |
| 1998 | 32 | 0 |
| 1999 | 46 | 0 |
| 2000 | 65 | 0 |
| 2001 | 55 | 39 |
| 2002 | 48 | 59 |
| 2003 | 36 | 84 |
| 2004 | 46 | 85 |
| 2005 | 44 | 69 |
| 2006 | 16 | 46 |
| 2007 | 36 | 61 |
| 2008 | 20 | 87 |
| 2009 | 29 | 103 |
| 2010 | 42 | 122 |
| 2011 | 43 | 145 |
| 2012 | 55 | 110 |
| 2013 | 60 | 101 |
| 2014 | 72 | 91 |
| 2015 | 63 | 113 |
| 2016 | 57 | 88 |
| 2017 | 59 | 90 |
| 2018 | 49 | 118 |
| 2019 | 70 | 94 |
| 2020 | 68 | 94 |
| 2021 | 54 | 85 |
| 2022 | 61 | 112 |
| 2023 | 66 | 106 |
| 2024 | 65 | 83 |
| 2025 | 61 | 78 |
| 2026 | 40 | 40 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Article with transparent conductive layer and method of making the same6 Oct 2026US 12,757,521 B2Vitro Flat Glass LLC
- Prevention of contamination of substrates during gas purging29 Sep 2026US 12,751,244 B2APPLIED Materials.Inc.
- Multi-stack susceptor reactor for high-throughput superconductor manufacturing1 Sep 2026US 12,727,392 B2MetOx International, Inc.
- Surface profiling and texturing of chamber components18 Aug 2026US 12,713,846 B2APPLIED Materials.Inc.
- Substrate treatment apparatus with virtual dummy wafer function and substrate treatment method4 Aug 2026US 12,701,953 B2ASM IP Holding B. V.
- Substrate processing method, method of manufacturing semiconductor device, non-transitory computer-readable recording medium and substrate processing apparatus24 Sep 2026US 2026/0286522 A1Kokusai Electric Corporation
- Article with Transparent Conductive Oxide Coating24 Sep 2026US 2026/0293366 A1Vitro Flat Glass LLC
- Deposition system with integrated carrier cleaning modules17 Sep 2026US 2026/0275502 A1Veeco Instruments Inc.
- Methods and systems for continuous roll-to-roll manufacturing of photovoltaic structures17 Sep 2026US 2026/0282592 A1Energy Materials Corporation
- Deposition system with integrated carrier cleaning modules10 Sep 2026US 2026/0265903 A1Veeco Instruments Inc.
Most cited
By later US patents
- Vertically-stacked process reactor and cluster tool system for atomic layer deposition876US 5,879,459 AGenus, Inc. · 1999
- Thermally floating pedestal collar in a chemical vapor deposition chamber805US 5,846,332 AAPPLIED Materials.Inc. · 1998
- Apparatus for growing thin films784US 5,855,680 ANeste Oy · 1999
- Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process777US 5,000,113 AAPPLIED Materials.Inc. · 1991
- High throughput multi station processor for multiple single wafers657US 4,987,856 AAdvanced Semiconductor Materials America, Inc. · 1991