Substrate treatment apparatus with virtual dummy wafer function and substrate treatment method

A substrate treatment apparatus comprising:

• a chamber;
• a substrate support stage located inside the chamber, the substrate support stage configured to move up and down;
• a gate valve provided between the chamber and an adjacent chamber that is adjacent to the chamber;
• and
• a chamber state controller including a processor and a memory configured to cause the processor to execute a program stored in the memory, or including a dedicated circuitry, to:
• move the substrate support stage and the gate valve before a next substrate treatment is performed in the chamber, in a state in which no substrate is present in the chamber;
• execute a dummy pre-recipe, a dummy main recipe and a dummy post-recipe that have the same contents as those of a pre-recipe, a main recipe and a post-recipe, wherein the dummy pre-recipe, the dummy main recipe, and the dummy post-recipe are carried out before the next substrate treatment is performed in the chamber and in the state in which no substrate is present in the chamber, and wherein the pre-recipe, the main recipe, and the post-recipe are used in the next substrate treatment, and
• execute an operation of moving the substrate support stage and moving the gate valve in the state in which no substrate is present in the chamber is performed between processes of the dummy pre-recipe and the dummy main recipe, and between processes of the dummy main recipe and the dummy post-recipe.