C23C 16/45589
Movable means
Official title: {Movable means, e.g. fans}
C23C16/45589 (Movable means) appears on 186 US grants and 231 published applications in this corpus.
Search patents in C23C- Granted patents
- 186
- Published applications
- 231
- Assignees
- 117
- Inventors
- 582
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 3 | 0 |
| 1996 | 5 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 1 | 0 |
| 2000 | 3 | 0 |
| 2001 | 8 | 1 |
| 2002 | 3 | 7 |
| 2003 | 9 | 8 |
| 2004 | 8 | 8 |
| 2005 | 7 | 16 |
| 2006 | 3 | 8 |
| 2007 | 2 | 12 |
| 2008 | 4 | 7 |
| 2009 | 1 | 9 |
| 2010 | 5 | 6 |
| 2011 | 4 | 11 |
| 2012 | 7 | 2 |
| 2013 | 4 | 16 |
| 2014 | 8 | 7 |
| 2015 | 5 | 12 |
| 2016 | 12 | 9 |
| 2017 | 11 | 12 |
| 2018 | 6 | 13 |
| 2019 | 10 | 9 |
| 2020 | 11 | 11 |
| 2021 | 6 | 7 |
| 2022 | 6 | 11 |
| 2023 | 7 | 6 |
| 2024 | 4 | 8 |
| 2025 | 5 | 10 |
| 2026 | 11 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Flow control arrangements, semiconductor processing systems having flow control arrangements, and flow control methods6 Oct 2026US 12,753,499 B2ASM IP Holding B. V.
- Apparatus for conducting plasma surface treatment, board treatment system having the same, and method of manufacturing semiconductor devices using the same6 Oct 2026US 12,755,942 B2New Power Plasma Co., Ltd.
- Precursor supply system28 Jul 2026US 12,692,600 B2Samsung Electronics Co., Ltd.
- Gas distribution apparatuses for improving mixing uniformity2 Jun 2026US 12,644,182 B2APPLIED Materials.Inc.
- Tunable hardware to control radial flow distribution in a processing chamber2 Jun 2026US 12,644,184 B2APPLIED Materials.Inc.
- Substrate processing apparatus, gas supply suppression structure, method of processing substrate, method of manufacturing semiconductor device, and recording medium27 Aug 2026US 2026/0250847 A1Kokusai Electric Corporation
- Gas flow adjustment device for furnace tube apparatus and furnace tube apparatus6 Aug 2026US 2026/0226623 A1Swaysure Technology Co., Ltd.
- Apparatuses and techniques for cleaning a multi-station semiconductor processing chamber6 Aug 2026US 2026/0229468 A1Lam Research Corporation
- Varying thickness isolation plate for use in semiconductor processing25 Jun 2026US 2026/0176763 A1APPLIED Materials.Inc.
- Process chamber volume adjustment7 May 2026US 2026/0125797 A1ASM IP Holding B. V.
Most cited
By later US patents
- Rapid thermal processing apparatus for processing semiconductor wafers624US 5,444,217 AMoore Epitaxial, Inc. · 1995
- Atomic layer deposition reactor604US 6,820,570 B2Nobel Biocare Services AG · 2004
- Method of and apparatus for tunable gas injection in a plasma processing system582US 6,872,259 B2Tokyo Electron Limited · 2005
- Shower head of a wafer treatment apparatus having a gap controller570US 6,872,258 B2Samsung Electronics Co., Ltd. · 2005
- Apparatus for supporting a substrate in a reaction chamber544US 6,692,575 B1CVC Products, Inc. · 2004