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AssigneeCVC Products, Inc.
InventorsThomas R. Omstead, Panya Wongsenakhum, William J. Messner, Edward J. Nagy, William Starks, Mehrdad M. Moslehi
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A method and system for fabricating a device on a substrate with a process gas, such as with chemical vapor deposition. A reaction chamber and support chuck cooperate to form a low conductance configuration for axisymetric process gas flow over the substrate and to form a high conductance configuration for enhanced evacuation of residual process gas from the reaction chamber upon completion of the process. A dual conductance chuck has an indented region that aligns with the exhaust port of the reaction chamber to restrict process gas flow in the low conductance configuration, and that moves distal a showerhead and the exhaust port to provide reduced restriction of process gas flow for reaction chamber evacuation. The chuck includes thermal control for enhancing film deposition on the substrate and for reducing residual film deposition on the chuck. An evacuation opening in the housing provides independent evacuation of residual gas from the housing. The present invention enhance throughput of device formation by reducing purge and process cycle times.
An apparatus for supporting a substrate in a reaction chamber for deposition of a material film on the substrate with a gas that flows over the substrate and exhausts from the reaction chamber, the apparatus comprising:
An apparatus for supporting a substrate in a reaction chamber for deposition of a material film on the substrate with a gas that flows proximate the substrate, the apparatus comprising:
An apparatus for supporting a substrate in a reaction chamber for chemical vapor deposition of a material film on the substrate, the apparatus comprising:
Dependencies are inferred from the claim text.