C23C 16/45514
Mixing in close vicinity to the substrate
Official title: {Mixing in close vicinity to the substrate}
C23C16/45514 (Mixing in close vicinity to the substrate) appears on 146 US grants and 186 published applications in this corpus.
Search patents in C23C- Granted patents
- 146
- Published applications
- 186
- Assignees
- 130
- Inventors
- 504
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 6 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 7 | 0 |
| 2000 | 5 | 0 |
| 2001 | 7 | 4 |
| 2002 | 7 | 10 |
| 2003 | 6 | 8 |
| 2004 | 4 | 10 |
| 2005 | 7 | 12 |
| 2006 | 2 | 7 |
| 2007 | 1 | 5 |
| 2008 | 4 | 7 |
| 2009 | 0 | 9 |
| 2010 | 8 | 8 |
| 2011 | 6 | 8 |
| 2012 | 4 | 8 |
| 2013 | 4 | 9 |
| 2014 | 4 | 6 |
| 2015 | 3 | 10 |
| 2016 | 7 | 7 |
| 2017 | 4 | 8 |
| 2018 | 5 | 8 |
| 2019 | 4 | 5 |
| 2020 | 6 | 10 |
| 2021 | 5 | 5 |
| 2022 | 1 | 3 |
| 2023 | 4 | 7 |
| 2024 | 4 | 10 |
| 2025 | 2 | 1 |
| 2026 | 5 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method of coating a coating region on a front surface of a substrate and apparatus for a thermal evaporation system16 Jun 2026US 12,655,520 B2Max-Planck-Gesellschaft Zur FöRderung Der Wissenschaften E. V.
- Gas injection apparatus for layer deposition16 Jun 2026US 12,655,522 B2Hanwha Precision Machinery Co., Ltd.
- Device for chemical vapour deposition5 May 2026US 12,618,150 B2Safran Ceramics
- Method of depositing a transition metal dichalcogenide5 May 2026US 12,618,152 B2Imec Vzw
- Chemical vapor deposition apparatus with multi-zone injection block24 Mar 2026US 12,584,223 B2Veeco Instruments Inc.
- Semiconductor processing systems and associated methods for forming super-lattice structures using semiconductor processing systems5 Mar 2026US 2026/0062803 A1ASM IP Holding B. V.
- Methods and systems for filling a gap27 Feb 2025US 2025/0066905 A1ASM IP Holding B. V.
- Device for chemical vapour deposition7 Nov 2024US 2024/0368757 A1Safran Ceramics
- Method of coating a coating region on a front surface of a substrate and apparatus for a thermal evaporation system3 Oct 2024US 2024/0327979 A1Max-Planck-Gesellschaft Zur FöRderung Der Wissenschaften E. V.
- Processing systems for metal precursor synthesis and deposition3 Oct 2024US 2024/0327983 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Dual gas faceplate for a showerhead in a semiconductor wafer processing system962US 6,086,677 AAPPLIED Materials.Inc. · 2000
- One-piece dual gas faceplate for a showerhead in a semiconductor wafer processing system864US 6,302,964 B1APPLIED Materials.Inc. · 2001
- Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactions763US 6,161,500 ATokyo Electron Limited · 2000
- Atomic layer deposition reactor604US 6,820,570 B2Nobel Biocare Services AG · 2004
- Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactions593US 6,368,987 B1Tokyo Electron Limited · 2002