Method of coating a coating region on a front surface of a substrate and apparatus for a thermal evaporation system
AssigneeMax-Planck-Gesellschaft zur Forderung der Wissenschaften e.V.
InventorWolfgang BRAUN
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Abstract
The present invention is related to a method of coating a coating region (58) on a front surface (56) of a substrate (50) with a source material (40) thermally evaporated and/or sublimated from a source (30) by electromagnetic radiation (80). Further, the present invention is related to an apparatus (100) for a thermal evaporation system (200) for coating a coating region (58) on a front surface (56) of a substrate (50) with a source material (40) thermally evaporated and/or sublimated by electromagnetic radiation (80) from a source (30).
Claims32
1-31. (canceled)
Method of coating a coating region on a front surface of a substrate with a source material thermally evaporated and/or sublimated from a source by electromagnetic radiation, whereby the source comprises one or more source sections consisting of the source material, whereby the substrate and the source are arranged within a reaction chamber containing a reaction atmosphere, whereby the electromagnetic radiation is provided as one or more incident radiation beams and coupled into the reaction chamber through a chamber window of the reaction chamber such that the one or more incident radiation beams and a normal to the surface of the source include an incident angle larger than 0° and smaller than 90° and thereby form a radiation plane,
- the method comprising the following steps:
- a) Providing the substrate with a substrate material transparent or at least essentially transparent to the electromagnetic radiation,
- b) Arranging the substrate within the reaction chamber between the chamber window and the source, whereby the front surface of the substrate faces the source and a back surface of the substrate faces the chamber window,
- c) Illuminating the source with the one or more incident radiation beams through the substrate during the coating process.
Apparatus for a thermal evaporation system for coating a coating region on a front surface of a substrate with a source material thermally evaporated and/or sublimated by electromagnetic radiation from a source, the apparatus comprising a source arrangement for arranging the source comprising one or more source sections consisting of the source material and a substrate arrangement for arranging the substrate, whereby the source arrangement and the substrate arrangement are arranged within a reaction chamber of the apparatus fillable with a reaction atmosphere, the reaction chamber further comprising a chamber window for coupling the electromagnetic radiation provided as one or more incident radiation beams into the reaction chamber such that the one or more incident radiation beams and a normal to the surface of the source include an incident angle larger 0° and smaller 90° and thereby form a radiation plane,
- wherein
- the substrate arrangement comprises a substrate holder for arranging the substrate between the chamber window and the source.
Dependencies are inferred from the claim text.