Device for chemical vapour deposition
AssigneeSafran Ceramics
InventorsArnaud DELEHOUZE, Rémi Pierre Robert BOUVIER, Manon FERNANDEZ
Life of this patent
Estimating the term…
Abstract
A device for fluidised bed chemical vapour deposition, includes a reactor including a treatment zone in which the fluidised bed chemical vapour deposition is intended to be carried out using at least a first and a second reactive gas and a diffuser under the treatment zone delimiting the reactor, and a heating system configured to heat at least the treatment zone. The device includes a first channel for introducing the first reactive gas and a second channel for introducing the second reactive gas, which second channel is separate from the first channel and opens out under the diffuser, and wherein the first introduction channel is capable of being moved with respect to the heating system.
Claims11
A device for fluidised bed chemical vapour deposition, comprising:
- a reactor comprising a treatment zone in which the fluidised bed chemical vapour deposition is intended to be carried out using at least a first and a second reactive gas and a diffuser under the treatment zone delimiting the reactor,
- a heating system configured to heat at least the treatment zone,
- a first channel for introducing the first reactive gas and a second channel for introducing the second reactive gas, which second channel is separate from the first channel and opens out under the diffuser, wherein the first introduction channel is capable of being moved with respect to the heating system.
A method for coating particles by fluidised bed chemical vapour deposition, comprising:
- introducing particles into the treatment zone of a reactor, the particles being made of ceramic material or of carbon;
- introducing a first reactive gas into a first channel for introducing gas;
- introducing a second reactive gas into a second channel for introducing gas, which second channel is separate from the first channel for introducing gas;
- and
- heating the treatment zone to a temperature enabling the reaction of the first and second reactive gases in the treatment zone so as to coat the particles,
- the first introduction channel opening out into a zone where the temperature is greater than that of the zone where the second channel opens out.
Dependencies are inferred from the claim text.