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US 2024/0327983 A1Published application
Processing systems for metal precursor synthesis and deposition
AssigneeApplied Materials, Inc.
InventorAndrea Leoncini
Life of this patent
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Abstract
Processing chambers for forming metal-containing precursors and deposition of pure metal films are disclosed. Also disclosed are deposition methods that include forming a metal-containing precursor and depositing the metal-containing precursor on a substrate to form a metal film in a single processing chamber.
Claims20
A processing chamber comprising:
- a chamber body having a top wall, a bottom wall, and two opposed sidewalls containing an interior volume;
- a metal source within the interior volume to provide metal atoms to a precursor formation region within the interior volume;
- and
- a ligand source to provide vaporized ligands to the precursor formation region, wherein the metal atoms and the vaporized ligands react to form a metal-containing precursor.
1 more element
A processing chamber comprising:
- a chamber body having a top wall, a bottom wall, and two opposed sidewalls containing an interior volume;
- a metal source within the interior volume to provide metal atoms to a precursor formation region within the interior volume;
- a ligand source to provide vaporized ligands to the precursor formation region, wherein the metal atoms and the vaporized ligands react to form a metal-containing precursor;
- and
- a substrate positioned on a substrate support within the interior volume, wherein the metal-containing precursor forms a metal film on the substrate.
2 more elements
A deposition method comprising:
- forming a metal-containing precursor by providing metal atoms to a precursor formation region from a metal source, the metal source and the precursor formation region within an interior volume of a processing chamber, and providing vaporized ligands to the precursor formation region from a ligand source, wherein the metal atoms and the vaporized ligands react to form the metal-containing precursor;
- and
- exposing a substrate surface to the metal-containing precursor to deposit a metal film.
Dependencies are inferred from the claim text.