C23C 14/505
For rotation of the substrates
Official title: {for rotation of the substrates}
C23C14/505 (For rotation of the substrates) appears on 829 US grants and 962 published applications in this corpus.
Search patents in C23C- Granted patents
- 829
- Published applications
- 962
- Assignees
- 487
- Inventors
- 2,199
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 9 | 0 |
| 1978 | 7 | 0 |
| 1979 | 3 | 0 |
| 1980 | 4 | 0 |
| 1981 | 7 | 0 |
| 1982 | 2 | 0 |
| 1983 | 2 | 0 |
| 1984 | 4 | 0 |
| 1985 | 2 | 0 |
| 1986 | 5 | 0 |
| 1987 | 2 | 0 |
| 1988 | 2 | 0 |
| 1989 | 6 | 0 |
| 1990 | 3 | 0 |
| 1991 | 4 | 0 |
| 1992 | 9 | 0 |
| 1993 | 8 | 0 |
| 1994 | 8 | 0 |
| 1995 | 10 | 0 |
| 1996 | 7 | 0 |
| 1997 | 5 | 0 |
| 1998 | 21 | 0 |
| 1999 | 22 | 0 |
| 2000 | 26 | 0 |
| 2001 | 18 | 9 |
| 2002 | 20 | 25 |
| 2003 | 14 | 23 |
| 2004 | 11 | 16 |
| 2005 | 15 | 31 |
| 2006 | 12 | 30 |
| 2007 | 10 | 21 |
| 2008 | 4 | 20 |
| 2009 | 7 | 27 |
| 2010 | 20 | 38 |
| 2011 | 15 | 46 |
| 2012 | 24 | 45 |
| 2013 | 34 | 40 |
| 2014 | 20 | 33 |
| 2015 | 36 | 35 |
| 2016 | 24 | 36 |
| 2017 | 21 | 41 |
| 2018 | 28 | 48 |
| 2019 | 28 | 62 |
| 2020 | 35 | 66 |
| 2021 | 46 | 48 |
| 2022 | 44 | 67 |
| 2023 | 40 | 44 |
| 2024 | 42 | 55 |
| 2025 | 55 | 37 |
| 2026 | 25 | 19 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Surface pre-oxidized AlCrVTiSiON nano-gradient coating and preparation method thereof22 Sep 2026US 12,742,236 B2
- Substrate support unit, and apparatus and method for depositing a layer using the same15 Sep 2026US 12,740,377 B2Evatec AG
- Metallic coating process for combustor panels using a barrel configuration1 Sep 2026US 12,723,302 B2Rtx Corporation
- Multicathode PVD system for high aspect ratio barrier seed deposition25 Aug 2026US 12,716,125 B2APPLIED Materials.Inc.
- Surface treatment apparatus25 Aug 2026US 12,719,023 B2Shibaura Machine Co., Ltd.
- Deposition apparatus, thin-film deposition method using the same, and electronic apparatus manufactured using the same8 Oct 2026US 2026/0308749 A1Samsung Display Co., Ltd.
- Rotary electrical feedthrough integration for process chamber8 Oct 2026US 2026/0308750 A1APPLIED Materials.Inc.
- Vapour deposition device and method of depositing a material layer onto a substrate24 Sep 2026US 2026/0286503 A1Demcon Tsst B.V.
- Sputtering with good compositional uniformity17 Sep 2026US 2026/0275492 A1APPLIED Materials.Inc.
- Sputtering unit for processing substrate in vertical position27 Aug 2026US 2026/0250833 A1Sea, Ltd.
Most cited
By later US patents
- Magnetron sputtering apparatus and process326US 4,851,095 AOptical Coating Laboratory, Inc. · 1989
- Catheter having a long-lasting antimicrobial surface treatment148US 5,520,664 ASpire Corporation · 1996
- Means to orbit and rotate target wafers supported on planet member122US 4,284,033 ARCA Corporation · 1981
- Superhard composite materials including compounds of carbon and nitrogen deposited on metal and metal nitride, carbide and carbonitride112US 5,776,615 ANorthwestern University · 1998
- Physical vapor deposition dual coating process97US 5,234,561 AHauzer Industries bv · 1993