Vapour deposition device and method of depositing a material layer onto a substrate

A vapour deposition device for depositing a material layer onto a substrate, in particular a pulsed laser deposition device, wherein the vapour deposition device comprises:

• a substrate holder comprising a substrate holding surface for holding a material deposition substrate thereon;
• a target holder for holding a source of material to be deposited onto the substrate held on the substrate holding surface;
• and
• a vaporisation unit arranged for directing a vaporising beam to the target holder to vaporise, at a beam end where the vaporising beam hits the material source held by the target holder, a portion of the material source for the vaporised portion to be deposited onto the substrate held on the substrate holding surface;
• and
• wherein the device is arranged to relatively move the beam end relative to the target holder in at least two nonparallel directions for scanning the beam end over an area of the material source;
• and
• wherein the device is arranged to relatively move the target holder relative to the substrate holding surface in a direction which is non-perpendicular to the substrate holding surface.