C23C 14/3478
Using electrons
Official title: {using electrons, e.g. triode sputtering}
C23C14/3478 (Using electrons) appears on 19 US grants and 12 published applications in this corpus.
Search patents in C23C- Granted patents
- 19
- Published applications
- 12
- Assignees
- 17
- Inventors
- 58
- Latest grant
- 22 Feb 2022
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 2 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 1 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 1 | 2 |
| 2007 | 1 | 1 |
| 2008 | 0 | 0 |
| 2009 | 0 | 1 |
| 2010 | 1 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 1 |
| 2013 | 1 | 1 |
| 2014 | 0 | 1 |
| 2015 | 1 | 1 |
| 2016 | 2 | 1 |
| 2017 | 0 | 0 |
| 2018 | 2 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 1 |
| 2021 | 0 | 0 |
| 2022 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Sputtering system and method22 Feb 2022US 11,257,663 B2Agency for Science, Technology and Research
- Methods of forming molybdenum sputtering targets27 Mar 2018US 9,926,623 B2H. C. Starck GmbH
- Apparatus for enhanced physical vapor deposition6 Mar 2018US 9,911,583 B1HIA, Inc.
- Remote arc discharge plasma assisted processes9 Aug 2016US 9,412,569 B2Vapor Technologies, Inc.
- Methods of depositing thin films using molybdenum sputtering targets12 Apr 2016US 9,309,591 B2H. C. Starck GmbH
- Sputtering system and method3 Sep 2020US 2020/0279723 A1Agency for Science, Technology and Research
- Methods of forming molybdenum sputtering targets30 Jun 2016US 2016/0186311 A1H. C. Starck GmbH
- Methods of depositing thin films using molybdenum sputtering targets21 May 2015US 2015/0136584 A1H. C. Starck GmbH
- Remote Arc Discharge Plasma Assisted Processes20 Mar 2014US 2014/0076718 A1Vapor Technologies, Inc.
- Methods of forming molybdenum sputtering targets29 Aug 2013US 2013/0224059 A1H. C. Starck GmbH
Most cited
By later US patents
- Apparatus and process for producing a thin layer on a substrate48US 5,110,435 A1992
- Supported plasma sputtering apparatus for high deposition rate over large area28US 4,038,171 ABattelle Memorial Institute · 1977
- Workpiece support apparatus for use with cathode sputtering devices17US 4,271,005 AUnited Technologies Corporation · 1981
- Triode sputtering system13US 4,111,783 ABell Telephone Laboratories, Incorporated · 1978
- Method of producing coating using negative DC pulses with specified duty factor13US 5,192,578 ABalzers Aktiengesellschaft · 1993