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US 9,926,623 B2Granted
Methods of forming molybdenum sputtering targets
AssigneeH.C. Starck GmbH
InventorsBrad Lemon, Joseph Hirt, Timothy Welling, James G. Daily, III, David Meendering, Gary Rozak, Jerome O'Grady, Prabhat Kumar, Steven A. Miller, Rong-chein Richard Wu, David G. Schwartz
Life of this patent
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Abstract
In various embodiments, sputtering targets are formed by introducing molybdenum powder into a sheet bar mold, pressing the powder to form a sheet bar, sintering the sheet bar to form an ingot having a density of at least 90% of a theoretical density, preheating the ingot, rolling the ingot to form a plate, and heat treating the plate.
Claims25
A method of making a sputtering target, the method comprising:
- introducing molybdenum powder into a sheet bar mold;
- pressing the powder to form a sheet bar;
- sintering the sheet bar at a first temperature to form an ingot having a density of at least 90% of a theoretical density;
- preheating the ingot at a second temperature;
- rolling the ingot, whereby a thickness of the ingot is reduced, to form a plate;
- and
- heat treating the plate at a third temperature.
4 more elements
Dependencies are inferred from the claim text.