C23C 14/3435
Applying energy to the substrate during sputtering
Official title: {Applying energy to the substrate during sputtering}
C23C14/3435 (Applying energy to the substrate during sputtering) appears on 634 US grants and 786 published applications in this corpus.
Search patents in C23C- Granted patents
- 634
- Published applications
- 786
- Assignees
- 333
- Inventors
- 1,704
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 2 | 0 |
| 1979 | 1 | 0 |
| 1980 | 2 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 5 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
| 1989 | 3 | 0 |
| 1990 | 4 | 0 |
| 1991 | 2 | 0 |
| 1992 | 5 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 8 | 0 |
| 1997 | 4 | 0 |
| 1998 | 7 | 0 |
| 1999 | 7 | 0 |
| 2000 | 12 | 0 |
| 2001 | 18 | 7 |
| 2002 | 24 | 10 |
| 2003 | 14 | 22 |
| 2004 | 19 | 25 |
| 2005 | 13 | 16 |
| 2006 | 5 | 29 |
| 2007 | 10 | 22 |
| 2008 | 9 | 17 |
| 2009 | 9 | 31 |
| 2010 | 14 | 21 |
| 2011 | 10 | 25 |
| 2012 | 6 | 53 |
| 2013 | 32 | 38 |
| 2014 | 37 | 36 |
| 2015 | 32 | 28 |
| 2016 | 20 | 22 |
| 2017 | 14 | 38 |
| 2018 | 20 | 21 |
| 2019 | 23 | 38 |
| 2020 | 29 | 45 |
| 2021 | 30 | 46 |
| 2022 | 32 | 51 |
| 2023 | 36 | 47 |
| 2024 | 40 | 47 |
| 2025 | 49 | 31 |
| 2026 | 16 | 20 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method of operating a PVD apparatus22 Sep 2026US 12,745,577 B2SPTS Technologies Limited
- Al-rich AlTiN-based films7 Jul 2026US 12,674,231 B2Oerlikon Surface Solutions AG, PfäFfikon
- Ion beam deposition of a low resistivity metal30 Jun 2026US 12,668,870 B2Veeco Instruments Inc.
- Method for producing transparent conductive coatings for emi protection using HiPIMS26 May 2026US 12,637,753 B2Raytheon Company
- Coated tool12 May 2026US 12,623,292 B2MOLDINO Tool Engineering, Ltd.
- Ion beam deposition system for a low resistivity metal17 Sep 2026US 2026/0275498 A1Veeco Instruments Inc.
- PVD Device with Adjustable Rotation Radius of Magnetron and Source Power Applied to Planar Target and Application Method Thereof17 Sep 2026US 2026/0275499 A1Arrayed Materials (China) Co., Ltd.
- Film deposition method20 Aug 2026US 2026/0242927 A1Ulvac, Inc.
- Max-ag electrically conductive composite coating and preparation method thereof6 Aug 2026US 2026/0226606 A1Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences
- Deposition of ain on a silicon substrate and gan semiconductor transition layer structure6 Aug 2026US 2026/0231701 A1Epinovatech AB
Most cited
By later US patents
- Step coverage and overhang improvement by pedestal bias voltage modulation330US 5,976,327 AAPPLIED Materials.Inc. · 1999
- Apparatus for depositing material into high aspect ratio holes273US 5,178,739 AInternational Business Machines Corporation · 1993
- Method of and apparatus for sputtering149US 4,999,096 AHitachi, Ltd. · 1991
- Piezoelectric shear wave resonator and method of making same135US 4,719,383 AThe United States of America as represented by the United States Department of Energy · 1988
- System, method and apparatus for controlling ion energy distribution128US 9,287,086 B2Advanced Energy Industries, Inc. · 2016