Al-rich AlTiN-based films
AssigneeOerlikon Surface Solutions AG, PfäFfikon
InventorsDenis Kurapov, Siva Phani Kumar Yalamanchili, Anders Olof Eriksson
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Abstract
This invention relates to a coating comprising at least one AlTiN-based film deposited by means of a PVD process, wherein the at least one AlTiN-based film deposited is comprising an Al-content—in relation to the Ti-content—in atomic percentage higher than 75%, and wherein the AlTiN-based film exhibits solely a crystallographic cubic phase and internal compressive stresses and this invention relates to a method involving deposition of an AlTiN-based film.
Claims5
A coating comprising at least one AlTiN-based film deposited using a PVD process, wherein the at least one AlTiN-based film deposited comprises an Al-content—in relation to a Ti-content—in atomic percentage 76% or higher, and wherein the AlTiN-based film exhibits solely a crystallographic cubic phase and internal compressive stresses,
- wherein said at least one AlTiN-based film has a chemical composition in atomic percentage corresponding to the formula (AlaTib)(NcArd)y with 0<d<0.02, 1≥c>0.98, a+b=1, c+d=1 and a>0.75, where a, b, c and d are an atomic fraction of a concentration of aluminum, titanium, nitrogen and argon, respectively, and 0.8≤y≤1.2,
- the content of argon in the at least one AlTiN-based film corresponds to d>0,
- said at least one AlTiN-based film exhibits internal compressive stresses in a range between 1 GPa and 6 GPa, and
- said at least one AlTiN-based film shows higher elastic modulus of over 400 GPa, and a hardness is—at least essentially—44 GPa.
Dependencies are inferred from the claim text.