C23C 14/0682
Silicides
Official title: {Silicides}
C23C14/0682 (Silicides) appears on 84 US grants and 86 published applications in this corpus.
Search patents in C23C- Granted patents
- 84
- Published applications
- 86
- Assignees
- 76
- Inventors
- 225
- Latest grant
- 2 Sep 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 2 | 0 |
| 2000 | 4 | 0 |
| 2001 | 2 | 3 |
| 2002 | 2 | 2 |
| 2003 | 2 | 1 |
| 2004 | 2 | 4 |
| 2005 | 1 | 2 |
| 2006 | 1 | 3 |
| 2007 | 1 | 4 |
| 2008 | 2 | 2 |
| 2009 | 4 | 6 |
| 2010 | 4 | 2 |
| 2011 | 3 | 5 |
| 2012 | 1 | 5 |
| 2013 | 2 | 2 |
| 2014 | 1 | 2 |
| 2015 | 2 | 1 |
| 2016 | 1 | 2 |
| 2017 | 5 | 5 |
| 2018 | 5 | 4 |
| 2019 | 7 | 6 |
| 2020 | 2 | 5 |
| 2021 | 2 | 2 |
| 2022 | 3 | 6 |
| 2023 | 3 | 5 |
| 2024 | 4 | 3 |
| 2025 | 5 | 2 |
| 2026 | 0 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Tungsten silicide target member and method for manufacturing same, and method for manufacturing tungsten silicide film2 Sep 2025US 12,404,580 B2JX Advanced Metals Corporation
- Plasma based film modification for semiconductor devices8 Jul 2025US 12,351,900 B2APPLIED Materials.Inc.
- Method for producing a coating20 May 2025US 12,305,270 B2Oerlikon Surface Solutions AG, PfäFfikon
- PVD target and use thereof20 May 2025US 12,305,274 B1Zhejiang Shintown Industry Co., Ltd
- Apparatus for manufacturing display device, method of manufacturing mask assembly, and method of manufacturing display device1 Apr 2025US 12,264,391 B2Samsung Display Co., Ltd.
- Metal silicide for contact and methods of forming same18 Jun 2026US 2026/0173472 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Mirror layer and mirror for a lithographic apparatus2 Apr 2026US 2026/0093060 A1ASML Netherlands B. V.
- Tungsten silicide target and method for manufacturing same, and method for manufacturing tungsten silicide film27 Nov 2025US 2025/0361599 A1JX Advanced Metals Corporation
- Pellicle membrane for a lithographic apparatus21 Aug 2025US 2025/0264795 A1ASML Netherlands B. V.
- Plasma based film modification for semiconductor devices24 Oct 2024US 2024/0352575 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Apparatus and method for manufacturing planarized aluminum films80US 4,661,228 AVarian Associates, Inc. · 1987
- Semiconductor film and process for its production77US 5,194,398 AMitsui Toatsu Chemicals, Inc. · 1993
- Amorphous electrode compositions60US 6,699,336 B23M Innovative Properties Company · 2004
- Low angle, low energy physical vapor deposition of alloys50US 5,725,739 AMicron Technology, Inc. · 1998
- Transducer for use in harsh environments36US 7,538,401 B2Rosemount Aerospace Inc. · 2009