PVD target and use thereof
AssigneeZhejiang Shintown Industry Co., Ltd
InventorsJianzhong Tang, Mingwei Zhang, Yiqi Yao
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Abstract
The present application discloses a PVD target, the PVD target consists of the following components by mass percentage: silicon 10-30% and a balance metal, the metal includes one or more selected from a group consisting of chromium, zirconium, and titanium. The PVD target provided in the present application can form a composite film composed of metal, silicon, metal nitrides, silicon nitride, and metal silicides on a surface of a metal substrate after undergoing physical vapor deposition. The composite film can ensure a tight bonding of the composite film through a combination of substances with different particle sizes, isolate air, and avoid gaps present in PVD films formed from single-element targets.
Claims7
Use of a physical vapor deposition (PVD) target in cookware, wherein a PVD coating is provided on an internal metal layer of the cookware by depositing the PVD target on the internal metal layer of the cookware using a PVD process, the PVD target consists of the following components by mass percentage:
- silicon 10-30% and a balance metal, wherein the metal comprises one or more selected from a group consisting of chromium, zirconium, and titanium, and a thickness of the PVD coating is 0.8-3 μm.
Dependencies are inferred from the claim text.