C11D 2111/22
Electronic devices
Official title: Electronic devices, e.g. PCBs or semiconductors
C11D2111/22 (Electronic devices) appears on 1,474 US grants and 1,876 published applications in this corpus.
Search patents in C11D- Granted patents
- 1,474
- Published applications
- 1,876
- Assignees
- 478
- Inventors
- 3,125
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 3 | 0 |
| 1992 | 2 | 0 |
| 1993 | 5 | 0 |
| 1994 | 4 | 0 |
| 1995 | 5 | 0 |
| 1996 | 5 | 0 |
| 1997 | 15 | 0 |
| 1998 | 37 | 0 |
| 1999 | 45 | 0 |
| 2000 | 50 | 0 |
| 2001 | 48 | 24 |
| 2002 | 60 | 63 |
| 2003 | 58 | 88 |
| 2004 | 43 | 98 |
| 2005 | 36 | 103 |
| 2006 | 43 | 99 |
| 2007 | 54 | 89 |
| 2008 | 48 | 81 |
| 2009 | 56 | 67 |
| 2010 | 51 | 75 |
| 2011 | 64 | 57 |
| 2012 | 51 | 76 |
| 2013 | 55 | 63 |
| 2014 | 51 | 56 |
| 2015 | 55 | 79 |
| 2016 | 63 | 74 |
| 2017 | 52 | 81 |
| 2018 | 47 | 51 |
| 2019 | 39 | 72 |
| 2020 | 65 | 56 |
| 2021 | 50 | 57 |
| 2022 | 52 | 88 |
| 2023 | 42 | 72 |
| 2024 | 37 | 76 |
| 2025 | 44 | 72 |
| 2026 | 39 | 59 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Cleaning solution, method for cleaning substrate, and method for manufacturing semiconductor6 Oct 2026US 12,753,366 B2Tokyo Ohka Kogyo.Co., Ltd.
- Detergent composition and chemical-mechanical polishing composition comprising an alkanol hydroxylamine and polyglycerol derivative mixture22 Sep 2026US 12,742,133 B2Daicel Corporation
- Cleaning liquid and method for manufacturing semiconductor device8 Sep 2026US 12,729,348 B2Kabushiki Kaisha Toshiba
- Cleaning liquid and method for cleaning semiconductor substrate8 Sep 2026US 12,733,424 B2FUJIFILM Corporation
- Method for producing treatment liquid4 Aug 2026US 12,698,454 B2FUJIFILM Corporation
- Processing solution, method for processing semiconductor substrate, and method for manufacturing semiconductor device1 Oct 2026US 2026/0297465 A1Tokyo Ohka Kogyo.Co., Ltd.
- Cleaning composition and method of forming photoresist pattern using the same1 Oct 2026US 2026/0297469 A1Dongwoo Fine-Chem Co., Ltd.
- Surface treatment agent, silicon compound, and method for suppressing pattern collapse when substrate surface is cleaned with cleaning liquid24 Sep 2026US 2026/0286256 A1Tokyo Ohka Kogyo.Co., Ltd.
- Cleaning Compositions17 Sep 2026US 2026/0275243 A1Fujifilm Electronic Materials U.S.A., Inc.
- Electronic device manufacturing aqueous solution, method for producing resist pattern, and method for manufacturing device10 Sep 2026US 2026/0265643 A1Merck Patent GmbH
Most cited
By later US patents
- Method for forming a photoresist pattern487US 7,467,632 B2Hynix Semiconductor Inc. · 2008
- Cleaning solution for photoresist and method for forming pattern using the same470US 7,238,653 B2Hynix Semiconductor Inc. · 2007
- Semiconductor wafer cleaning system181US 5,656,097 AVerteq, Inc. · 1997
- Cleaning compositions for removing etching residue and method of using150US 5,334,332 AEKC Technology, Inc. · 1994
- Post clean treatment composition comprising an organic acid and hydroxylamine137US 5,981,454 AEKC Technology, Inc. · 1999