Electronic device manufacturing aqueous solution, method for producing resist pattern, and method for manufacturing device

Abstract

An electronic device manufacturing aqueous solution includes: an acid (A); a surfactant (B); and a solvent (C). The acid (A) has a pKa (H2O) of 3.0 or less, and a number of carbon atoms contained in the acid (A) is 0 to 8 in one molecule. The surfactant (B) is substantially free from ethylene oxide repeating units and propylene oxide repeating units. The solvent (C) includes water (C-1). The electronic device manufacturing aqueous solution is a high-performance material that can be used in the nanotechnology process of semiconductor device manufacturing, for example, in the manufacturing process of semiconductor devices that control liquid crystal, quantum dot, or OLED displays formed on a substrate.

Dependencies are inferred from the claim text.