C08F 220/1807
C7-acrylate
Official title: {C7-(meth)acrylate, e.g. heptyl (meth)acrylate or benzyl (meth)acrylate}
C08F220/1807 (C7-acrylate) appears on 268 US grants and 435 published applications in this corpus.
Search patents in C08F- Granted patents
- 268
- Published applications
- 435
- Assignees
- 140
- Inventors
- 925
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 1 |
| 2003 | 0 | 1 |
| 2004 | 0 | 2 |
| 2005 | 1 | 3 |
| 2006 | 1 | 3 |
| 2007 | 2 | 9 |
| 2008 | 5 | 5 |
| 2009 | 3 | 10 |
| 2010 | 3 | 10 |
| 2011 | 7 | 26 |
| 2012 | 5 | 14 |
| 2013 | 18 | 12 |
| 2014 | 18 | 26 |
| 2015 | 18 | 23 |
| 2016 | 21 | 16 |
| 2017 | 17 | 31 |
| 2018 | 14 | 24 |
| 2019 | 14 | 28 |
| 2020 | 18 | 29 |
| 2021 | 17 | 34 |
| 2022 | 20 | 34 |
| 2023 | 24 | 40 |
| 2024 | 16 | 21 |
| 2025 | 13 | 20 |
| 2026 | 6 | 13 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Resist composition and patterning process16 Jun 2026US 12,656,683 B2Shin-Etsu Chemical Co., Ltd.
- Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device2 Jun 2026US 12,645,140 B2FUJIFILM Corporation
- Actinic-ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device5 May 2026US 12,619,146 B2FUJIFILM Corporation
- Positive resist composition and pattern forming process17 Feb 2026US 12,554,197 B2Shin-Etsu Chemical Co., Ltd.
- Liquid chemical and method for producing liquid chemical17 Feb 2026US 12,554,201 B2FUJIFILM Corporation
- Radiation-sensitive composition, method for forming pattern, polymer, and compound3 Sep 2026US 2026/0259498 A1Jsr Corporation
- Affibody micelle drug conjugate13 Aug 2026US 2026/0232835 A1Kowa Company, Ltd.
- Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming method30 Jul 2026US 2026/0217888 A1Shin-Etsu Chemical Co., Ltd.
- Radiation-sensitive composition and method for forming resist pattern30 Jul 2026US 2026/0219577 A1Jsr Corporation
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device9 Jul 2026US 2026/0194813 A1FUJIFILM Corporation
Most cited
By later US patents
- (Meth)acrylate ester-based resin composition24US 6,489,396 B2Nippon Shokubai Co., Ltd. · 2002
- Thermotropic biphilic hydrogels and hydroplastics22US 5,147,923 ACiba-Geigy Corporation · 1992
- Positive resist compositions and patterning process14US 7,449,277 B2Shin-Etsu Chemical C., Ltd · 2008
- Photocurable resin composition and a method for forming a pattern14US 8,288,079 B2Hitachi Chemical Company, Ltd. · 2012
- Optical resin material13US 4,868,261 AHitachi Chemical Company, Ltd. · 1989