Photocurable resin composition and a method for forming a pattern

A method for forming a pattern comprising the steps of:

• forming on a substrate surface a film of a solvent-free photocurable resin composition containing a photopolymerization initiator and a (meth)acrylate monomer and/or oligomer having a cyclic structure, wherein the carbon atoms in said cyclic structure and the whole carbon atoms in the composition satisfy the relation (1) specified below:
• (1) the relation between the total atomic weight of the carbon atoms (Mcr) in said cyclic structure and the total atomic weight of the whole carbon (MTOT) in said composition meets Mcr/MTOT>0.1;
• press-contacting a face of a mold with a fine pattern formed thereon against a surface of said film of photocurable resin composition;
• and
• curing said film of photocurable resin composition by irradiation with light to form a fine pattern.

A method for forming a pattern comprising the steps of:

• forming on a substrate surface a film of a solvent-free photocurable resin composition containing a photopolymerization initiator and a (meth)acrylate monomer and/or oligomer having a cyclic structure, wherein the relation between the total atomic weight of the carbon atoms (Mcr) in said cyclic structure and the total atomic weight of the whole carbon (MTOT) in said composition meets Mcr/MTOT>0.1, and wherein said resin composition has a kinetic viscosity of 10 mPa·s or below;
• press-contacting a face of a mold with a fine pattern formed thereon against a surface of said film of photocurable resin composition;
• and
• curing said film of photocurable resin composition by irradiation with light to transfer the fine pattern to said film of photocurable resin composition.