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US 2026/0219577 A1Published application
Radiation-sensitive composition and method for forming resist pattern
AssigneeJsr Corporation
InventorKen MARUYAMA
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Abstract
A radiation-sensitive composition contains: a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid; and a compound having an anion and a radiation-sensitive onium cation. The polymer has a structural unit including a group that generates a sulfonic acid by an action of radiation. The polymer includes an iodo group. At least one of the anion and the radiation-sensitive onium cation includes an acid-labile group.
Claims5
A radiation-sensitive composition comprising:
- a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid;
- and
- a compound comprising an anion and a radiation-sensitive onium cation, wherein
- the polymer has a structural unit comprising a group that generates a sulfonic acid by an action of radiation,
- the polymer comprises an iodo group, and
- at least one of the anion and the radiation-sensitive onium cation comprises an acid-labile group.
3 more elements
Dependencies are inferred from the claim text.