Liquid chemical and method for producing liquid chemical
AssigneeFUJIFILM Corporation
InventorTetsuya Kamimura
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Abstract
An object of the present invention is to provide a liquid chemical exhibiting excellent defect inhibitive performance even in a case of being applied to a resist process by EUV exposure. Another object thereof is to provide a method for producing a liquid chemical. The liquid chemical of the present invention includes an organic solvent; Fe nanoparticles containing a Fe atom and having a particle size of 0.5 to 17 nm; and Pb nanoparticles containing a Pb atom and having a particle size of 0.5 to 17 nm, in which a ratio of the number of the Fe nanoparticles contained to the number of the Pb nanoparticles contained is 1.0 to 1.0×104, based on the number of the particles per unit volume of the liquid chemical.
Claims20
A liquid chemical comprising:
- an organic solvent;
- Fe nanoparticles containing a Fe atom and having a particle size of 0.5 to 17 nm;
- and
- Pb nanoparticles containing a Pb atom and having a particle size of 0.5 to 17 nm,
- wherein a ratio of the number of the Fe nanoparticles contained to the number of the Pb nanoparticles contained is 1.0 to 1.0×104, based on the number of the particles per unit volume of the liquid chemical and
- the organic solvent is at least one selected from the group consisting of propylene glycol monoethyl ether (PGME), propylene glycol monopropyl ether, propylene glycol monomethyl ether acetate (PGMEA), methyl methoxypropionate, diisoamyl ether, isoamyl acetate, cycloheptanone and 2-heptanone.
Dependencies are inferred from the claim text.