Positive resist compositions and patterning process
AssigneeShin-Etsu Chemical C., Ltd
InventorsJun Hatakeyama, Takeshi Nagata, Takanobu Takeda
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Abstract
A polymer is obtained from (meth)acrylate having a bridged ring lactone group, (meth)acrylate having an acid-labile leaving group, and (meth)acrylate having a hydroxynaphthyl pendant. A positive resist composition comprising the polymer as a base resin, when exposed to high-energy radiation and developed, exhibits a high sensitivity, a high resolution, and a minimal line edge roughness due to controlled swell during development, and leaves minimal residues following development.
Claims14
A positive resist composition comprising a polymer comprising at least recurring units of the general formulae (a) and (b):
- wherein R1 is each independently hydrogen or methyl, R2 is a hydroxy group, acid labile group-substituted hydroxy group, carboxyl group, or acid labile group-substituted carboxyl group, R3 is a lactone-containing adhesive group, X is a single bond, m is 1 or 2, a and b are numbers in the range:
- 0<a<1.0 and 0<b≦0.8,
- said lactone-containing adhesive group, as represented by R3, being selected from the group consisting of the following formulae:
Dependencies are inferred from the claim text.