Radiation-sensitive composition, method for forming pattern, polymer, and compound
AssigneeJsr Corporation
InventorsDaichi WATANABE, Masafumi ITAGAKI, Yoshiki NONOYAMA, Tomoya CHOSA
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AssigneeJsr Corporation
InventorsDaichi WATANABE, Masafumi ITAGAKI, Yoshiki NONOYAMA, Tomoya CHOSA
Estimating the term…
A radiation-sensitive composition includes: a polymer (A) including a structural unit (I) represented by formula (1); and a solvent (B). The polymer (A) includes a radiation-sensitive acid-generating structural unit (IV), or the composition includes a radiation-sensitive acid generator (C) other than the polymer (A), or both. At least one selected from the group consisting of the polymer (A) and the radiation-sensitive acid generator (C) includes an iodo group. R1 is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; Ar represents a furan ring, a thiophene ring, or an aromatic heterocycle having 9 to 20 ring members including a furan ring or a thiophene ring; and R2 is a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms.
A radiation-sensitive composition comprising:
A polymer comprising a structural unit (I) represented by formula (1):
A compound represented by formula (1-1):
A compound represented by formula (1-2-1) or formula (1-2-2):
A compound represented by formula (1-3):
A compound represented by formula (1-4):
A compound represented by formula (1-5):
Dependencies are inferred from the claim text.