Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

• a resin of which polarity increases through decomposition by an action of an acid;
• and
• a compound that generates an acid upon irradiation with actinic rays or radiation,
• wherein the resin of which polarity increases through decomposition by an action of an acid includes one or more selected from the group consisting of repeating units represented by Formulae (3a) to (3d) and one or more selected from the group consisting of repeating units represented by Formulae (5a) to (5d), and
• the compound that generates an acid upon irradiation with actinic rays or radiation includes any one or more of a compound (I) or a compound (II),
• in Formulae (5a) and (5b), X′ and Z each independently represent a hydrogen atom or a substituent, Y represents a substituent, provided that at least one of X′'s represents a substituent,
• in Formulae (5c) to (5d), X and Z each independently represent a hydrogen atom or a substituent, and X's may be bonded to each other to form a ring structure,
• in Formulae (3a) to (3d), Rb5 and Rb7 to Rb24 each independently represent a hydrogen atom or a substituent, and Rb6 represents an organic group,
• Compound (I):
• a compound having one or more moieties of the following structural moiety X and one or more moieties of the following structural moiety Y, where the compound generates an acid including the following first acidic moiety derived from the following structural moiety X and the following second acidic moiety derived from the following structural moiety Y upon irradiation with actinic rays or radiation,
• Structural moiety X:
• a structural moiety which consists of an anionic moiety A1− and a cationic moiety M1+, and forms a first acidic moiety represented by HA1 upon irradiation with actinic rays or radiation,
• Structural moiety Y:
• a structural moiety which consists of an anionic moiety A2− and a cationic moiety M2+, and forms a second acidic moiety represented by HA2 upon irradiation with actinic rays or radiation,
• provided that the compound (I) satisfies the following condition I,
• Condition I:
• a compound PI formed by substituting the cationic moiety M1+ in the structural moiety X and the cationic moiety M2+ in the structural moiety Y with H+ in the compound (I) has an acid dissociation constant a1 derived from an acidic moiety represented by HA1, formed by substituting the cationic moiety M1+ in the structural moiety X with H+, and an acid dissociation constant a2 derived from an acidic moiety represented by HA2, formed by substituting the cationic moiety M2+ in the structural moiety Y with H+, and the acid dissociation constant a2 is larger than the acid dissociation constant a1,
• Compound (II):
• a compound having two or more moieties of the structural moiety X and one or more moieties of the following structural moiety Z, the compound generating an acid including two or more moieties of the first acidic moiety derived from the structural moiety X and the structural moiety Z upon irradiation with actinic rays or radiation,
• Structural moiety Z:
• a nonionic moiety capable of neutralizing an acid.