B81C 2201/0181
Physical vapour deposition [pvd], i.e. evaporation, sputtering, ion plating or plasma assisted
Official title: Physical Vapour Deposition [PVD], i.e. evaporation, sputtering, ion plating or plasma assisted deposition, ion cluster beam technology
B81C2201/0181 (Physical vapour deposition [pvd], i.e. evaporation, sputtering, ion plating or plasma assisted) appears on 95 US grants and 148 published applications in this corpus.
Search patents in B81C- Granted patents
- 95
- Published applications
- 148
- Assignees
- 83
- Inventors
- 346
- Latest grant
- 7 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2000 | 1 | 0 |
| 2001 | 0 | 1 |
| 2002 | 2 | 1 |
| 2003 | 1 | 1 |
| 2004 | 1 | 4 |
| 2005 | 0 | 2 |
| 2006 | 0 | 2 |
| 2007 | 2 | 3 |
| 2008 | 1 | 9 |
| 2009 | 1 | 2 |
| 2010 | 2 | 4 |
| 2011 | 2 | 5 |
| 2012 | 1 | 3 |
| 2013 | 4 | 2 |
| 2014 | 1 | 5 |
| 2015 | 1 | 2 |
| 2016 | 2 | 12 |
| 2017 | 6 | 8 |
| 2018 | 14 | 12 |
| 2019 | 4 | 5 |
| 2020 | 12 | 11 |
| 2021 | 6 | 9 |
| 2022 | 3 | 3 |
| 2023 | 9 | 14 |
| 2024 | 8 | 5 |
| 2025 | 7 | 14 |
| 2026 | 4 | 9 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Atomic-smooth device with microstructure, and method for preparing same7 Jul 2026US 12,673,866 B2
- Biomaterial detection sensor and method of manufacturing the same19 May 2026US 12,631,572 B2Samsung Electronics Co., Ltd.
- Micro-electro mechanical system and manufacturing method thereof24 Feb 2026US 12,559,362 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Micro-electro-mechanical system (MEMs) devices including sidewall stoppers27 Jan 2026US 12,534,362 B2Vanguard International Semiconductor Corporation
- Mems platform for thin film nanomechanics characterization11 Nov 2025US 12,469,673 B2Carnegie Mellon University
- Method for manufacturing sensor and sensor27 Aug 2026US 2026/0251603 A1Kabushiki Kaisha Toshiba
- Manufacturing process of a microelectromechanical system with multiple cavities at different pressures and related microelectromechanical system20 Aug 2026US 2026/0242215 A1STMicroelectronics International N. V.
- Silicon-metal composite micro-electro-mechanical system-based material atmospheric corrosion sensor, preparation method therefor, and material atmospheric corrosion detection equipment25 Jun 2026US 2026/0176132 A1University of Science and Technology Beijing
- Micro-electro mechanical system and manufacturing method thereof4 Jun 2026US 2026/0152385 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Mems component comprising a mems element having a cavity and comprising an asic component14 May 2026US 2026/0132017 A1Robert Bosch GmbH
Most cited
By later US patents
- Method for electrochemical fabrication261US 6,027,630 AUniversity of Southern California · 2000
- Method for electrochemical fabrication64US 6,790,377 B1University of Southern California · 2004
- Method for electrochemical fabrication59US 6,475,369 B1University of Southern California · 2002
- Apparatus for electrochemical fabrication using a conformable mask49US 6,572,742 B1University of Southern California · 2003
- Electrochemically fabricated structures having dielectric or active bases and methods of and apparatus for producing such structures17US 7,250,101 B2Microfabrica Inc. · 2007