B24B 37/105
The workpieces or work carriers being actively moved by a drive
Official title: {the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement}
B24B37/105 (The workpieces or work carriers being actively moved by a drive) appears on 413 US grants and 427 published applications in this corpus.
Search patents in B24B- Granted patents
- 413
- Published applications
- 427
- Assignees
- 142
- Inventors
- 856
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 2 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 4 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 6 | 0 |
| 1997 | 13 | 0 |
| 1998 | 15 | 0 |
| 1999 | 28 | 0 |
| 2000 | 13 | 0 |
| 2001 | 18 | 6 |
| 2002 | 14 | 6 |
| 2003 | 7 | 4 |
| 2004 | 4 | 3 |
| 2005 | 6 | 7 |
| 2006 | 7 | 3 |
| 2007 | 2 | 5 |
| 2008 | 2 | 2 |
| 2009 | 1 | 4 |
| 2010 | 1 | 4 |
| 2011 | 1 | 8 |
| 2012 | 3 | 19 |
| 2013 | 11 | 9 |
| 2014 | 11 | 18 |
| 2015 | 11 | 21 |
| 2016 | 11 | 19 |
| 2017 | 20 | 26 |
| 2018 | 26 | 37 |
| 2019 | 25 | 40 |
| 2020 | 24 | 27 |
| 2021 | 16 | 31 |
| 2022 | 18 | 26 |
| 2023 | 36 | 29 |
| 2024 | 24 | 25 |
| 2025 | 18 | 31 |
| 2026 | 9 | 17 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Polishing method for gallium nitride wafer6 Oct 2026US 12,757,663 B2Disco Corporation
- Polishing apparatus for substrate and polishing method for substrate using the same1 Sep 2026US 12,722,250 B2Samsung Electronics Co., Ltd.
- Polishing head, polishing apparatus, and elastic body18 Aug 2026US 12,708,980 B2Kioxia Corporation
- Chemical mechanical polishing temperature scanning apparatus for temperature control14 Jul 2026US 12,678,912 B2APPLIED Materials.Inc.
- Pad conditioner cut rate monitoring17 Mar 2026US 12,576,476 B2APPLIED Materials.Inc.
- Chemical mechanical polishing temperature scanning apparatus for temperature control8 Oct 2026US 2026/0307202 A1APPLIED Materials.Inc.
- Polishing apparatus, substrate processing apparatus, polishing method, and determination device17 Sep 2026US 2026/0273687 A1Ebara Corporation
- Polishing tool and method10 Sep 2026US 2026/0264193 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Substrate processing device and substrate processing method27 Aug 2026US 2026/0249419 A1Ebara Corporation
- Substrate polishing device and polishing pad13 Aug 2026US 2026/0233356 A1Ebara Corporation
Most cited
By later US patents
- System for real-time control of semiconductor wafer polishing including optical monitoring282US 5,658,183 AMicron Technology, Inc. · 1997
- System for real-time control of semiconductor wafer polishing including optical montoring249US 5,730,642 AMicron Technology, Inc. · 1998
- Chemical mechanical polishing apparatus with improved carrier and method of use216US 5,624,299 AAPPLIED Materials.Inc. · 1997
- System for real-time control of semiconductor wafer polishing186US 5,851,135 AMicron Technology, Inc. · 1998
- Method of chemical mechanical polishing182US 5,934,980 AMicron Technology, Inc. · 1999