Polishing apparatus, substrate processing apparatus, polishing method, and determination device

A polishing method for performing polishing of a substrate by bringing a polishing pad and the substrate into contact with each other in presence of a polishing liquid by a polishing apparatus including

• a polishing table for supporting the polishing pad having a polishing surface,
• a polishing head for holding the substrate, and
• a polishing liquid supply device for supplying the polishing liquid to between the polishing pad and the substrate, the method comprising:
• performing detection of a signal related to at least one of a size, shape, dispersibility, and optical property of particles, from the polishing liquid positioned on the polishing surface, or the polishing liquid positioned in a flow path or a chamber that communicates with a pad opening portion formed in the polishing pad, and
• performing particle determination to determine whether the polishing liquid on which the detection has been performed contains particles that damage the substrate, based on particle data indicating at least one of the size, shape, dispersibility, and optical property of the particles obtained based on the signal detected by a detector, and correspondence information indicating correspondence of the size of particles of the polishing liquid, and whether the particles are the particles that damage the substrate.

A determination device that determines a state of a polishing liquid in a polishing apparatus, wherein

• the polishing apparatus
• includes a polishing table for supporting a polishing pad having a polishing surface,
• a polishing head for holding a substrate, and
• a polishing liquid supply device for supplying the polishing liquid to between the polishing pad and the substrate, and
• performs polishing of the substrate by bringing the polishing pad and the substrate into contact with each other in presence of the polishing liquid,
• the polishing apparatus further includes a detector that performs detection of a signal related to at least one of a size, shape, dispersibility, and optical property of particles, from the polishing liquid positioned on the polishing surface, or the polishing liquid positioned in a flow path or a chamber that communicates with a pad opening portion formed in the polishing pad, and
• the determination device is configured to perform particle determination to determine whether the polishing liquid on which the detection has been performed contains particles that damage the substrate, based on particle data indicating at least one of the size, shape, dispersibility, and optical property of the particles obtained based on the signal detected by the detector, and correspondence information indicating correspondence of at least one of the size, shape, dispersibility, and optical property of the particles of the polishing liquid, and whether the particles are the particles that damage the substrate.