Y10S 148/118
Oxide films
Y10S148/118 (Oxide films) appears on 145 US grants and 9 published applications in this corpus.
Search patents in Y10S- Granted patents
- 145
- Published applications
- 9
- Assignees
- 66
- Inventors
- 259
- Latest grant
- 29 Jul 2014
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 9 | 0 |
| 1977 | 9 | 0 |
| 1978 | 6 | 0 |
| 1979 | 5 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 3 | 0 |
| 1985 | 3 | 0 |
| 1986 | 6 | 0 |
| 1987 | 5 | 0 |
| 1988 | 3 | 0 |
| 1989 | 9 | 0 |
| 1990 | 5 | 0 |
| 1991 | 6 | 0 |
| 1992 | 4 | 0 |
| 1993 | 17 | 0 |
| 1994 | 14 | 0 |
| 1995 | 8 | 0 |
| 1996 | 4 | 0 |
| 1997 | 8 | 0 |
| 1998 | 1 | 0 |
| 1999 | 3 | 0 |
| 2000 | 1 | 0 |
| 2001 | 2 | 0 |
| 2002 | 2 | 3 |
| 2003 | 2 | 0 |
| 2004 | 1 | 2 |
| 2005 | 0 | 0 |
| 2006 | 2 | 0 |
| 2007 | 0 | 1 |
| 2008 | 2 | 1 |
| 2009 | 0 | 1 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 1 | 1 |
| 2014 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Methods for reoxidizing an oxide and for fabricating semiconductor devices29 Jul 2014US 8,790,982 B2Micron Technology, Inc.
- Structures including an at least partially reoxidized oxide material23 Jul 2013US 8,492,851 B2Micron Technology, Inc.
- Ion-assisted oxidation methods and the resulting structures13 May 2008US 7,371,697 B2Micron Technology, Inc.
- Thin-film transistor8 Apr 2008US 7,355,202 B2Semiconductor Energy
- Ion-assisted oxidation methods and the resulting structures10 Oct 2006US 7,119,033 B2Micron Technology, Inc.
- Methods for reoxidizing an oxide and for fabricating semiconductor devices21 Nov 2013US 2013/0309855 A1Micron Technology, Inc.
- Thin-film transistor23 Apr 2009US 2009/0101910 A1
- Ion-assisted oxidation methods and the resulting structures28 Aug 2008US 2008/0203542 A1Micron Technology, Inc.
- Ion-assisted oxidation methods and the resulting structures15 Mar 2007US 2007/0059943 A1Micron Technology, Inc.
- Ion-assisted oxidation methods and the resulting structures30 Dec 2004US 2004/0266213 A1Micron Technology, Inc.
Most cited
By later US patents
- Anisotropic deposition of silicon dioxide805US 5,013,691 AAT&T Bell Laboratories · 1991
- High step coverage silicon oxide thin films547US 5,098,865 A1992
- Method for fabricating a semiconductor device having a multi-layered interconnection structure281US 5,334,552 ANEC Corporation · 1994
- Method of manufacturing semiconductor devices270US 5,413,967 AKabushiki Kaisha Toshiba · 1995
- Deposition of silicon-containing films using organosilicon compounds and nitrogen trifluoride261US 4,894,352 ATexas Instruments Incorporated · 1990