Y10S 148/09
Laser anneal
Y10S148/09 (Laser anneal) appears on 101 US grants and 6 published applications in this corpus.
Search patents in Y10S- Granted patents
- 101
- Published applications
- 6
- Assignees
- 46
- Inventors
- 189
- Latest grant
- 12 May 2015
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 3 | 0 |
| 1980 | 4 | 0 |
| 1981 | 3 | 0 |
| 1982 | 2 | 0 |
| 1983 | 6 | 0 |
| 1984 | 5 | 0 |
| 1985 | 4 | 0 |
| 1986 | 1 | 0 |
| 1987 | 4 | 0 |
| 1988 | 5 | 0 |
| 1989 | 8 | 0 |
| 1990 | 5 | 0 |
| 1991 | 6 | 0 |
| 1992 | 3 | 0 |
| 1993 | 3 | 0 |
| 1994 | 5 | 0 |
| 1995 | 5 | 0 |
| 1996 | 7 | 0 |
| 1997 | 5 | 0 |
| 1998 | 5 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 1 | 1 |
| 2003 | 1 | 2 |
| 2004 | 0 | 1 |
| 2005 | 1 | 0 |
| 2006 | 0 | 0 |
| 2007 | 1 | 1 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 1 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 1 |
| 2014 | 0 | 0 |
| 2015 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Apparatus and methods for rapid thermal processing12 May 2015US 9,029,739 B2APPLIED Materials.Inc.
- Laser processing apparatus and laser processing process21 Sep 2010US 7,799,665 B2Semiconductor Energy Laboratory Co.Ltd.
- Laser processing apparatus and laser processing process20 Feb 2007US 7,179,726 B2Semiconductor Energy Laboratory Co.Ltd.
- Semiconductor device method of manufacturing13 Dec 2005US 6,974,732 B2Semiconductor Energy Laboratory Co.Ltd.
- Laser processing apparatus and laser processing process28 Oct 2003US 6,638,800 B1Semiconductor Energy Laboratory Co.Ltd.
- Apparatus and methods for rapid thermal processing5 Dec 2013US 2013/0323936 A1Lawrence Livermore National Security, LLC
- Laser processing apparatus and laser processing process21 Jun 2007US 2007/0141859 A1Semiconductor Energy Laboratory Co.Ltd.
- Semiconductor device and fabricating method thereof25 Mar 2004US 2004/0058486 A1Semiconductor Energy Laboratory Co.Ltd.
- Laser processing apparatus and laser processing process14 Aug 2003US 2003/0153167 A1Semiconductor Energy Laboratory Co.Ltd.
- Semiconductor device and fabricating method thereof16 Jan 2003US 2003/0010982 A1Semiconductor Energy Laboratory Co.Ltd.
Most cited
By later US patents
- Method of producing sheets of crystalline material345US 4,727,047 AMassachusetts Institute of Technology · 1988
- Apparatus for zone melting recrystallization of thin semiconductor film221US 5,304,357 ARicoh Company, Ltd. · 1994
- Laser processing method of semiconductor device using a catalyst221US 5,756,364 ASemiconductor Energy Laboratory Co.Ltd. · 1998
- Method of forming polycrystalline silicon layer on substrate by large area excimer laser irradiation201US 5,529,951 ASony Corporation · 1996
- Method for forming polycrystalline thin film and method for fabricating thin-film transistor184US 5,766,989 AMatsushita Electric Industrial Co., Ltd. · 1998