Apparatus for zone melting recrystallization of thin semiconductor film
AssigneeRicoh Company, Ltd.
InventorsYukito Sato, Mitsugu Irinoda, Kouichi Ohtaka, Takeshi Hino, Masafumi Kumano
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AssigneeRicoh Company, Ltd.
InventorsYukito Sato, Mitsugu Irinoda, Kouichi Ohtaka, Takeshi Hino, Masafumi Kumano
Estimating the term…
An apparatus for zone melting a thin semiconductor film comprises an first laser for heating the thin semiconductor film, at least one additional laser for heating an insulating substrate, a first temperature detecting device for detecting the temperature of a melted portion of the thin semiconductor film, and a second temperature detecting device for detecting the temperature of a solidified portion of the thin semiconductor film. The apparatus further comprises a first controller for controlling an output of the first laser so as to maintain the temperature of the melted portion in a first predetermined temperature range, and a second controller for controlling an output of the additional laser so as to maintain the temperature of the solidified portion in a second predetermined temperature range.
An apparatus for producing a thin film semiconductor element by heating to recrystallise a composite of insulating substrate and semiconductor layer thereon, comprising:
An apparatus for zone melting a thin semiconductor film disposed on an insulating substrate of a composite, comprising:
Dependencies are inferred from the claim text.