H10D 30/0241
Doping of vertical sidewalls
Official title: {doping of vertical sidewalls, e.g. using tilted or multi-angled implants}
H10D30/0241 (Doping of vertical sidewalls) appears on 788 US grants and 847 published applications in this corpus.
Search patents in H10D- Granted patents
- 788
- Published applications
- 847
- Assignees
- 106
- Inventors
- 1,115
- Latest grant
- 6 Oct 2026
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| Year | Granted patents | Published applications |
|---|---|---|
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| 2008 | 8 | 11 |
| 2009 | 8 | 12 |
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| 2017 | 94 | 104 |
| 2018 | 83 | 88 |
| 2019 | 82 | 76 |
| 2020 | 75 | 57 |
| 2021 | 47 | 45 |
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| 2023 | 36 | 29 |
| 2024 | 26 | 16 |
| 2025 | 25 | 22 |
| 2026 | 9 | 4 |
By publication year. 2026 runs to 8 Oct.
Recent patents
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- Semiconductor device having non-metal-oxide semiconductor capacitor and mos capacitor regions with doped fin-shaped structures and method for fabricating the same24 Sep 2026US 2026/0293176 A1United Microelectronics Corp.
- Field effect transistor for reducing hot carrier damage and methods for forming the same17 Sep 2026US 2026/0282425 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Semiconductor device and method of manufacture12 Mar 2026US 2026/0075867 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Semiconductor structure with source/drain multi-layer structure and method for forming the same8 Jan 2026US 2026/0013172 A1Parabellum Strategic Opportunities Fund LLC
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Most cited
By later US patents
- Conformal doping via plasma activated atomic layer deposition and conformal film deposition594US 8,956,983 B2Novellus Systems, Inc. · 2015
- Method of doping semiconductors546US 8,071,451 B2Axcelis Technologies, Inc. · 2011
- Strained and uniform doping technique for FINFETs535US 9,093,514 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2015
- Methods for forming doped silicon oxide thin films485US 8,679,958 B2ASM International N.V. · 2014
- Methods for forming doped silicon oxide thin films478US 9,153,441 B2ASM International N.V. · 2015