H05K 2203/056

Using an artwork, i.e. a photomask for exposing photosensitive layers

H05K2203/056 (Using an artwork, i.e. a photomask for exposing photosensitive layers) appears on 180 US grants and 57 published applications in this corpus.

Search patents in H05K

Granted patents: 180
Published applications: 57
Assignees: 113
Inventors: 316
Latest grant: 29 Oct 2024

Filings by year

H05K 2203/056: granted patents and published applications per publication year
Year	Granted patents	Published applications
1976	4	0
1977	4	0
1978	4	0
1979	0	0
1980	3	0
1981	4	0
1982	4	0
1983	5	0
1984	5	0
1985	7	0
1986	7	0
1987	8	0
1988	4	0
1989	3	0
1990	8	0
1991	4	0
1992	9	0
1993	5	0
1994	8	0
1995	6	0
1996	6	0
1997	8	0
1998	7	0
1999	2	0
2000	2	0
2001	4	1
2002	2	5
2003	7	2
2004	0	2
2005	3	0
2006	1	4
2007	1	4
2008	1	1
2009	1	6
2010	2	7
2011	2	0
2012	6	4
2013	2	3
2014	4	2
2015	0	1
2016	2	2
2017	1	4
2018	2	2
2019	4	0
2020	3	4
2021	3	1
2022	0	1
2023	0	0
2024	2	1

By publication year. Applications have been published since 2001.

Recent patents

Optically functional multilayer structure and related method of manufacture29 Oct 2024US 12,130,005 B2Tactotek Oy
Photosensitive element, resin composition for forming barrier layer, method for forming resist pattern, and method for manufacturing printed wiring board16 Apr 2024US 11,960,208 B2Resonac Corporation
Thermally expandable material, sheet material, circuit board, method for manufacturing circuit board, computer readable storage medium, electronic apparatus, and structure to analyze heat-generation position19 Jan 2021US 10,897,817 B2Casio Computer Co., Ltd.
Microcapsule, sheet material, circuit board, method for manufacturing circuit board, and computer readable storage medium12 Jan 2021US 10,893,607 B2Casio Computer Co., Ltd.
Method for manufacturing flexible printed circuit board (FPCB) and apparatus for manufacturing FPCB5 Jan 2021US 10,887,997 B2Inktec Co., Ltd.

Most cited

By later US patents