H01J 37/3441
Dark space shields
Official title: {Dark space shields}
H01J37/3441 (Dark space shields) appears on 179 US grants and 198 published applications in this corpus.
Search patents in H01J- Granted patents
- 179
- Published applications
- 198
- Assignees
- 59
- Inventors
- 432
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 2 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 3 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 5 | 0 |
| 1996 | 5 | 0 |
| 1997 | 4 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 2 | 0 |
| 2001 | 3 | 0 |
| 2002 | 3 | 1 |
| 2003 | 4 | 5 |
| 2004 | 1 | 4 |
| 2005 | 2 | 4 |
| 2006 | 2 | 0 |
| 2007 | 0 | 3 |
| 2008 | 0 | 3 |
| 2009 | 1 | 6 |
| 2010 | 0 | 2 |
| 2011 | 0 | 6 |
| 2012 | 1 | 7 |
| 2013 | 1 | 6 |
| 2014 | 6 | 10 |
| 2015 | 11 | 11 |
| 2016 | 9 | 5 |
| 2017 | 4 | 14 |
| 2018 | 9 | 10 |
| 2019 | 4 | 10 |
| 2020 | 6 | 18 |
| 2021 | 15 | 13 |
| 2022 | 15 | 20 |
| 2023 | 15 | 17 |
| 2024 | 21 | 7 |
| 2025 | 12 | 10 |
| 2026 | 2 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Shutter disc for a semiconductor processing tool6 Oct 2026US 12,753,488 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Physical vapor deposition apparatus10 Feb 2026US 12,548,746 B2Samsung Electronics Co., Ltd.
- Protective metal oxy-fluoride coatings9 Dec 2025US 12,492,464 B2APPLIED Materials.Inc.
- PVD system and collimator16 Sep 2025US 12,416,074 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Methods and apparatus for depositing amorphous indium tin oxide film19 Aug 2025US 12,392,023 B1APPLIED Materials.Inc.
- Semiconductor process chamber and semiconductor process equipment30 Jul 2026US 2026/0218372 A1Beijing Naura Microelectronics Equipment Co., Ltd.
- Method and device for providing a plasma for plasma treatment16 Jul 2026US 2026/0204523 A1Gruenwald Laboratories GmbH
- System and Method for In situ Atomic Layer Etching (ALE) and Radical-Based Highly Selective Etching (HSE)9 Jul 2026US 2026/0196454 A1Inspiring Atoms Pte Ltd
- Physical vapor deposition apparatus14 May 2026US 2026/0135070 A1Samsung Electronics Co., Ltd.
- Sputtering apparatus and sputtering method5 Mar 2026US 2026/0066248 A1Japan Display Inc.
Most cited
By later US patents
- Process kit and target for substrate processing chamber379US 9,127,362 B2APPLIED Materials.Inc. · 2015
- Sputtering process and apparatus180US 4,166,018 AAirco, Inc. · 1979
- Plasma reactor and shields generating self-ionized plasma for sputtering70US 6,398,929 B1APPLIED Materials.Inc. · 2002
- Baffled perforated shield in a plasma sputtering reactor58US 6,296,747 B1APPLIED Materials.Inc. · 2001
- Target and dark space shield for a physical vapor deposition system56US 5,658,442 AAPPLIED Materials.Inc. · 1997