Target and dark space shield for a physical vapor deposition system

Apparatus for a physical vapor deposition system comprising:

• a target comprising:
• a central region, being the region to be sputtered, having a center and an edge, the edge having an inclined sidewall connecting a first corner to a second corner;
• a flange, radially extending from the central region at said second corner, having a support surface for supporting said target within said physical vapor deposition system in a parallel spaced apart relation to a substrate support surface of a substrate support assembly;
• and
• the first corner being further from said center of said central region than the second corner, where the first corner forms an overhang that shadows the second corner, the edge and the flange, to impede deposition of sputtered material upon said inclined sidewall;
• and
• a dark space shield, mounted proximate said first corner of said target, to form a gap between said dark space shield and said support surface and said edge.