H01J 37/228
Whereby illumination or light collection take place in the same area of
Official title: {whereby illumination or light collection take place in the same area of the discharge}
H01J37/228 (Whereby illumination or light collection take place in the same area of) appears on 183 US grants and 185 published applications in this corpus.
Search patents in H01J- Granted patents
- 183
- Published applications
- 185
- Assignees
- 99
- Inventors
- 444
- Latest grant
- 23 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 2 | 0 |
| 1991 | 3 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 4 | 0 |
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 2 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 0 |
| 2003 | 1 | 3 |
| 2004 | 0 | 1 |
| 2005 | 2 | 0 |
| 2006 | 2 | 4 |
| 2007 | 2 | 4 |
| 2008 | 3 | 9 |
| 2009 | 4 | 5 |
| 2010 | 6 | 6 |
| 2011 | 5 | 7 |
| 2012 | 7 | 12 |
| 2013 | 7 | 8 |
| 2014 | 12 | 6 |
| 2015 | 3 | 13 |
| 2016 | 15 | 6 |
| 2017 | 8 | 6 |
| 2018 | 10 | 7 |
| 2019 | 10 | 8 |
| 2020 | 9 | 8 |
| 2021 | 9 | 13 |
| 2022 | 11 | 13 |
| 2023 | 9 | 14 |
| 2024 | 6 | 12 |
| 2025 | 12 | 14 |
| 2026 | 5 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Charged particle beam device21 Apr 2026US 12,609,274 B2Hitachi High-Tech Corporation
- Systems and methods for pulsed voltage contrast detection and capture of charging dynamics3 Mar 2026US 12,567,558 B2ASML Netherlands B. V.
- Analyzer and Analysis Method27 Aug 2026US 2026/0251596 A1JEOL Ltd.
- Substrate inspection apparatus and substrate inspection system23 Jul 2026US 2026/0213122 A1Samsung Electronics Co., Ltd.
- Tilt measurement in particle microscope systems11 Jun 2026US 2026/0162930 A1
- Systems and methods for pulsed voltage contrast detection and capture of charging dynamics4 Jun 2026US 2026/0155332 A1ASML Netherlands B. V.
- Method and system for calibrating a charged-particle spectrometer26 Mar 2026US 2026/0088248 A1Centre National De La Recherche Scientifique
Most cited
By later US patents
- Multilayered device micro etching method and system96US 5,055,696 AHitachi, Ltd. · 1991
- Process for controlling the strike positions of a plurality of electron beams on a melting bath77US 4,988,844 ALeybold Aktiengesellschaft · 1991
- Environmental scanning electron microscope43US 5,362,964 AElectroScan Corporation · 1994
- Phase shift mask, method of correcting the same and apparatus for carrying out the method42US 5,358,806 AHitachi, Ltd. · 1994
- Environmental scanning electron microscope42US 5,412,211 AElectroScan Corporation · 1995