H01J 37/1471
For centering, aligning or positioning of ray or beam
Official title: {for centering, aligning or positioning of ray or beam}
H01J37/1471 (For centering, aligning or positioning of ray or beam) appears on 246 US grants and 287 published applications in this corpus.
Search patents in H01J- Granted patents
- 246
- Published applications
- 287
- Assignees
- 86
- Inventors
- 562
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 2 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 1 | 0 |
| 2000 | 3 | 0 |
| 2001 | 0 | 2 |
| 2002 | 1 | 1 |
| 2003 | 3 | 4 |
| 2004 | 5 | 8 |
| 2005 | 6 | 4 |
| 2006 | 5 | 6 |
| 2007 | 4 | 5 |
| 2008 | 7 | 8 |
| 2009 | 4 | 5 |
| 2010 | 5 | 9 |
| 2011 | 5 | 4 |
| 2012 | 6 | 7 |
| 2013 | 9 | 8 |
| 2014 | 8 | 6 |
| 2015 | 7 | 13 |
| 2016 | 8 | 6 |
| 2017 | 9 | 9 |
| 2018 | 11 | 16 |
| 2019 | 17 | 26 |
| 2020 | 20 | 18 |
| 2021 | 17 | 20 |
| 2022 | 14 | 19 |
| 2023 | 15 | 22 |
| 2024 | 14 | 19 |
| 2025 | 16 | 28 |
| 2026 | 9 | 14 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Deflector for a charged particle beam apparatus, deflecting system, charged particle beam apparatus, and method of fabricating a deflector6 Oct 2026US 12,755,923 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Beam position displacement correction in charged particle inspection15 Sep 2026US 12,738,445 B2ASML Netherlands B. V.
- Magnetization device for an electron microscope and method8 Sep 2026US 12,731,756 B2Forschungszentrum Julich GmbH
- Electron beam application device21 Jul 2026US 12,688,992 B2Hitachi High-Tech Corporation
- Method and apparatus for processing a lithographic mask7 Jul 2026US 12,675,042 B2Carl Zeiss SMT GmbH
- Scanning electron microscope and methods for evaluating properties of a sample therewith20 Aug 2026US 2026/0245826 A1Applied Materials Israel Ltd.
- Charged particle beam writing apparatus, drift amount calculation method, and charged particle beam writing method20 Aug 2026US 2026/0245830 A1NuFlare Technology, Inc.
- Multipole magnet adjustment system and multipole magnet adjustment method13 Aug 2026US 2026/0237591 A1Kabushiki Kaisha Toshiba
- Method of configuring a charged particle beam system and charged particle beam system13 Aug 2026US 2026/0237599 A1ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Method for particle beam-induced processing of a defect of a microlithographic photomask16 Jul 2026US 2026/0204510 A1Carl Zeiss SMT GmbH
Most cited
By later US patents
- Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring121US 9,852,889 B1Lam Research Corporation · 2017
- Magnetic deflectors and charged-particle-beam lithography systems incorporating same64US 5,831,270 ANikon Corporation · 1998
- Twin beam charged particle column and method of operating thereof61US 8,378,299 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2013
- Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring57US 10,115,568 B2Lam Research Corporation · 2018
- Charged particle beam deflection method with separate stage tracking and stage positional error signals49US 8,384,048 B2Multibeam Corporation · 2013